Adjustable performance irradiation crosslinking ethylene-tetrafluoroethene copolymer insulation material
A technology of tetrafluoroethylene and cross-linked ethylene, which is applied in the direction of insulators, organic insulators, plastic/resin/wax insulators, etc., can solve the problems of harsh processing temperature, easy self-polymerization of cross-linking agents, and poor thermal stability. Good stability, not easy to self-aggregate, good stability effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1~5
[0027] Embodiments 1-5: A radiation-crosslinked ethylene-tetrafluoroethylene copolymer insulating material with adjustable properties, consisting of the following components by mass:
[0028] 100 parts of ethylene-tetrafluoroethylene copolymer,
[0029] 0.3~5 parts of crosslinking agent,
[0030] 0.1~1 part of N,N'-bis[β-(3,5-di-tert-butyl-4-hydroxyphenyl)propionyl]hydrazine,
[0031] 0.3~3 parts of 1,3,5-tris(3,5-di-tert-butyl-4-hydroxybenzyl)isocyanuric acid,
[0032] 0~5 parts of antimony trioxide,
[0033] 0.1~2 parts of N,N'-ethylene bisstearamide,
[0034] 0.1~3 parts of white oil;
[0035] The crosslinking agent is formed by mixing component A and component B, the mass ratio of component A: component B is 1:0.1~10, wherein component A conforms to the following general structural formula (1):
[0036] (1)
[0037] Wherein X is vinyl, allyl, methallyl or propargyl, n=2~15, and the weight average molecular weight of X is 600~5000;
[0038] The component B is at le...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com