Yttrium modified chromium aluminium carbonitride/silicon nitride nano composite coating and deposition method thereof
A nano-composite coating, chrome-aluminum carbonitride technology, applied in coatings, metal material coating processes, layered products, etc., can solve problems such as corrosion and easy oxidation of coatings
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Embodiment 1
[0011] Single crystal silicon wafer, M42 high speed steel standard sample and 8mm twist drill bit are coated after degreasing, derusting, organic solution cleaning and plasma cleaning. The deposition temperature is 250°C, the workpiece is applied with a pulsed negative bias, the frequency is 80KHz, the peak value is 400V, the duty cycle is 60%, the Ar is introduced, the air pressure is 0.4Pa, and the DC magnetron sputtering Cr is turned on. 49 al 49 Y 2 (atomic ratio) target, power density 5W / cm 2 , deposit CrAlY alloy bonding layer for 5min; pulse bias negative voltage peak value is adjusted to 200V, and CrAlY target power density is increased to 10W / cm 2 , Ar partial pressure linearly decreased from 0.4Pa to 0.2Pa within 10 minutes, and N 2 , N 2 The partial pressure is linearly increased from 0Pa to 0.2Pa within 10 minutes, and the CrAlYN transition layer is deposited for 10 minutes; keep the bias, Ar and N 2 The partial pressure remains unchanged, and CH 4 , the part...
Embodiment 2
[0013] Single crystal silicon wafer, YG8 cemented carbide standard sample and 10mm flat end mill, after degreasing, derusting, organic solution cleaning and plasma cleaning, deposited coating. The deposition temperature is 400°C, the workpiece is applied with a pulsed negative bias, the frequency is 80KHz, the peak value is 600V, the duty cycle is 60%, the Ar is introduced, the air pressure is 0.4Pa, and the DC magnetron sputtering Cr is turned on. 39 al 59 Y 2 (Atomic ratio) target, power density 5W / cm2, deposition of CrAlY alloy bonding layer for 5min; pulse negative bias peak value adjusted to 200V, CrAlY target power density increased to 10W / cm 2 , Ar partial pressure decreased linearly from 0.4Pa to 0.2Pa within 10 minutes, and N 2 , N 2 The partial pressure is linearly increased from 0Pa to 0.2Pa within 10 minutes, and the CrAlYN transition layer is deposited for 10 minutes; keep the bias, Ar and N 2 The partial pressure remains unchanged, and CH 4 , the partial pre...
Embodiment 3
[0015] Single crystal silicon wafers, fine-grained hard alloy standard test samples and 1.2mm PCB milling cutters are coated after degreasing, derusting, organic solution cleaning and plasma cleaning. The deposition temperature is 300°C, the workpiece is applied with a pulsed negative bias, the frequency is 80KHz, the peak value is 300V, the duty cycle is 60%, the Ar is introduced, the air pressure is 0.3Pa, and the DC magnetron sputtering Cr is turned on. 39 al 59 Y 2 (atomic ratio) target, power density 5W / cm 2 , depositing a CrAlY alloy bonding layer for 2 minutes; the peak value of the pulse negative bias is adjusted to 200V, and the power density of the CrAlY target is increased to 15W / cm 2 , Ar partial pressure decreased linearly from 0.4Pa to 0.2Pa within 5 minutes, and N 2 , N 2 The partial pressure is linearly increased from 0Pa to 0.2Pa within 5 minutes, and the CrAlYN transition layer is deposited for 5 minutes; keep the bias, Ar and N 2 The partial pressure re...
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