Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Etching liquid composition and etching method

A technology of composition and etching solution, applied in the direction of surface etching composition, chemical instruments and methods, etc., can solve the problem of not simultaneously etching transparent conductive film and copper or copper alloy film, devices that cannot be applied to crystallized ITO film, etc. problems to achieve significant results

Inactive Publication Date: 2013-04-17
KANTO CHEM CO INC
View PDF9 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] However, in the same document, it is pointed out that the ITO film is also aimed at amorphous, and cannot be applied to a device using a crystallized ITO film.
[0015] As mentioned above, there is no sufficient research on the simultaneous etching of transparent conductive films and copper or copper alloy films.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching liquid composition and etching method
  • Etching liquid composition and etching method
  • Etching liquid composition and etching method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0081] Hereinafter, although an Example and a comparative example are given and the content of this invention is demonstrated in more detail, this invention is not limited to these Examples.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a display device of a flat panel display (FPD) and an etching liquid composition for the transparent conductive film used for the electrodes of a solar cell or a touch control panel, and provides an etching liquid composition for etching transparent conductive films such as copper and / or copper alloy film and indium tin oxide simultaneously, which includes hydrochloric acid, ferric chloride or copper chloride and water, wherein the concentration of hydrochloric acid is from 15.0 to 36.0 weight%, and the concentration of ferric chloride or copper chloride is from 0.05 to 2.00 weight%.

Description

technical field [0001] The present invention relates to simultaneous etching of transparent conductive films used in FPD (Flat Panel Display) display devices, solar cells, electrodes in touch panel sensors, etc., and copper and / or copper alloy films used in wiring, etc. Etching liquid composition, and the etching method using this etching liquid composition. Background technique [0002] Transparent conductive films are light-transmitting conductive materials used in flat-panel displays such as LCDs (liquid crystal displays) and ELDs (electroluminescent displays), solar cells, and touch panels. These transparent conductive films are made of, for example, indium tin oxide, indium oxide, tin oxide, or zinc oxide, among which indium tin oxide (hereinafter also referred to as ITO) is widely used. [0003] In order to use a transparent conductive film as an electrode of an FPD display, a solar cell, a touch panel, etc., it is necessary to form the transparent conductive film wit...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23F1/16C23F1/18
CPCC09K13/00C23F1/18
Inventor 山口隆雄石川典夫
Owner KANTO CHEM CO INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com