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Preparing technology for bionic molybdenum silicide gradient laminate compositing nanometer coatings

A technology of nano-coating and preparation process, which is applied in the direction of metal material coating process, coating, ion implantation plating, etc., can solve problems such as hindering the practical process, and achieve the purpose of inhibiting the expansion of instability, releasing the stress concentration at the tip, increasing the The effect of toughness

Inactive Publication Date: 2012-08-22
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

At present, the key problems that hinder its practical application process and need to be solved urgently are: ①Low temperature brittleness
② Oxidation and pulverization plague phenomenon in low temperature zone
However, two methods of alloying and compounding are used at the same time to improve the MoSi 2 The toughness, wear resistance, corrosion resistance and oxidation resistance of base nanocomposites have not been reported yet

Method used

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  • Preparing technology for bionic molybdenum silicide gradient laminate compositing nanometer coatings
  • Preparing technology for bionic molybdenum silicide gradient laminate compositing nanometer coatings
  • Preparing technology for bionic molybdenum silicide gradient laminate compositing nanometer coatings

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Experimental program
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Effect test

Embodiment 1

[0019] The preparation process of biomimetic molybdenum silicide gradient laminated composite nano-coating, using dual-cathode plasma sputtering deposition method to form a dense nano-crystalline silicide layer on the surface of the pure titanium workpiece.

[0020] a. Double cathode plasma sputtering process parameters:

[0021] Target voltage900 V Workpiece voltage350 V Distance between target and workpiece 15 mm Ar pressure 35Pa Deposition temperature 700℃

[0022] b. Sputtering target type: component ratio is Mo 0.35 (Si 0.95 ,Al 0.05 ) 0. 65 Powder metallurgy sintered plate is the target material;

[0023] c. The type of workpiece material: pure titanium.

[0024] figure 1 The composition ratio prepared by the hot isostatic pressing process is Mo 0.35 (Si 0.95 ,Al 0.05 ) 0.65 The powder metallurgy sintered plate is the target material, and the SEM picture of the gradient composite nanocrystalline silicide coating formed on the pure Ti surface. figure 2 TEM picture of ...

Embodiment 2

[0028] The preparation process of biomimetic molybdenum silicide gradient laminated composite nano-coating, using double-cathode plasma sputtering deposition method to form a dense nano-crystalline silicide layer on the surface of pure titanium workpiece, among which a. Double-cathode plasma sputtering process parameters: target voltage 1000 V, workpiece voltage 450 V, target and workpiece distance 30 mm, Ar pressure 45 Pa, deposition temperature 800 ℃; b. Sputtering target species: Mo 0.35-55 (Si 0.95 ,Al 0.05 ) 0.65-45 Powder metallurgy sintered plate is the target material; c. The type of workpiece material: pure titanium. The coating performance obtained is slightly lower than that of Example 1.

[0029]

Embodiment 3

[0031] The preparation process of biomimetic molybdenum silicide gradient laminated composite nano-coating, using double-cathode plasma sputtering deposition method to form a dense nano-crystalline silicide layer on the surface of pure titanium workpiece, including a. Double-cathode plasma sputtering process parameters: target voltage 800V, workpiece voltage 300 V, target and workpiece distance 10 mm, Ar gas pressure 30 Pa, deposition temperature 600 ℃; b. Sputtering target type: the composition ratio is Mo 0.35-55 (Si 0.95 ,Al 0.05 ) 0.65-45 Powder metallurgy sintered plate is the target material; c. The type of workpiece material: pure titanium. The coating performance obtained is slightly lower than that of Example 1.

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Abstract

Disclosed is a preparing technology for bionic molybdenum silicide gradient laminate compositing nanometer coatings. A double cathode plasma sputtering deposition method is used, a dense nanometer crystal silicide layer is formed on the surface of a titanium alloy workpiece, wherein double cathode plasma sputtering technological parameters are selected, and the type of sputtered target material is powder metallurgy sintered plate with an ingredient ratio of Mo of 0.35-55 (Si 0.95, Al 0.05) 0.65-45; and the type of workpiece material is titanium alloy. The gradient compositing nanometer crystal silicide layer has the advantages of having high toughness, high hardness and good corrosion resistance, and being capable of obviously improving abrasion resistance, corrosion resistance and oxidation resistance of the titanium alloy.

Description

technical field [0001] The invention provides a method for preparing bionic Mo 5 Si 3 / MoSi 2 Gradient layered composite nano-coating method. It is applicable to the preparation field of advanced high-toughness and wear-resistant composite gradient coatings on the surface of titanium alloys, and involves the preparation of advanced nanometer gradient composite coatings by means of surface modification. Background technique [0002] Metal silicide MoSi 2 As the most typical representative of refractory metal silicide, it has the dual characteristics of metal and ceramic, not only has metal-like electrical conductivity and high-temperature plasticity, but also has ceramic-like high melting point, high corrosion resistance and oxidation resistance. Potential candidate materials for high-temperature wear-resistant and corrosion-resistant coatings. At present, the key problems that hinder its practical application process and need to be solved urgently are: ①Low temperature ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 徐江毛相震李正阳
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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