Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof
A grating structure and embedded technology, which is applied in the direction of polarizing elements, microlithography exposure equipment, photolithography exposure equipment, etc., can solve the problems of unsuitable industrial application, low production efficiency, high cost, etc., and achieve high TM light transmission Efficiency, simple production process, high extinction ratio effect
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Embodiment 1
[0041] See attached figure 2 , Is a schematic diagram of a polarizer with a sub-wavelength embedded grating structure.
[0042] The transparent substrate 22 is made of glass or plastic film and has a thickness of 12-150um. The plastic may be polycarbonate (PC), polyvinyl chloride (PVC), polyester (PET), polymethyl methacrylate (PMMA) or polypropylene (BOPP).
[0043] The refractive index of the high refractive index medium layer 23 is greater than the refractive index of the substrate.
[0044] The high refractive index dielectric layer 23 can be TiO 2 , Ta 2 O 5 , ZnS and so on.
[0045] The metal layer 24 may be a layer of gold, silver, copper, or aluminum.
[0046]The dielectric grating 25 is made of plastic, and the plastic may be polycarbonate (PC), polyvinyl chloride (PVC), polyester (PET), polymethyl methacrylate (PMMA) or polypropylene (BOPP).
[0047] The cover layer 26 may be CaF 2 Or plastic or resin coating.
[0048] Among them, the period p of the dielectric grating ...
Embodiment 2
[0060] See figure 2 , Change the refractive index of the high refractive index medium layer, the refractive index of the medium cover layer, and the height of the metal layer in the first embodiment. The refractive index of the high refractive index dielectric layer 23 is 2.2, the dielectric covering layer 26 is CaF2, the refractive index is 1.4, and the height of the metal layer is h3=0.07um. The incident light 21 is visible light with a wavelength of 400nm-700nm and an incident angle of 0 degrees; the substrate 22 is a polyester film (PET) with a refractive index of 1.48; the metal layer 24 is aluminum; and the dielectric grating 25 is PMMA with a refractive index of 1.48. The other structural parameters of the polarizer are as follows: the substrate thickness is 1000um, the high refractive index dielectric layer thickness h1 is 0.05um, the height of the dielectric grating h2=0.1um, the thickness of the dielectric cover layer h4=0.1um, and the period of the dielectric grating p...
Embodiment 3
[0063] The thickness h4 of the dielectric covering layer in the first embodiment is changed, and the other parameters remain unchanged. When the incident wavelength is 400nm, the thickness of the dielectric covering layer h4 affects the transmission efficiency and extinction ratio of TM light as Figure 5 , Figure 6 Shown. With the increase of h4, the transmission efficiency of TM light periodically changes in the range of 87.0% to 91.6%, and the extinction ratio changes periodically in the range of 4.0E4 to 10.0E4. It can be seen that the medium cover layer can modulate the transmission efficiency of the polarizer.
[0064] Considering that the thickness of the dielectric cover layer is too thick, the thickness of the polarizer will increase, thereby increasing the difficulty of integrating the polarizer with other optical devices. Generally, the thickness of the dielectric cover layer corresponding to the first peak of the transmission efficiency of TM light is selected.
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