Method for preparation of polycrystalline silicon solar cell textile layer

Abstract

The present invention provides a polysilicon solar cell texture layer preparation method, relating to a solar cell, in particular to a polysilicon solar cell anti-reflection layer manufacturing process which utilizes a laser holographic method and is combined with a wet etching method. The present invention provides a polysilicon solar cell texture layer preparation method which is used for the fast manufacturing of large-area periodic microstructures, and has low cost as well as good anti-reflection effect. The preparation method comprises the following steps that: a polysilicon silicon chip is pretreated; holographic recording is carried out to a photoresist material on the surface of the polysilicon silicon chip for manufacturing two-dimensional periodic microstructure; with the photoresist as a structure template, a structure is manufactured into a silicon material by adopting acidic corrosive liquid.

Description

technical field [0001] The invention relates to a solar cell, in particular to a process for manufacturing a textured anti-reflection layer of a polycrystalline silicon solar cell using a laser holography method combined with a wet etching method. Background technique [0002] Texture technology is a surface treatment process that reduces surface reflectivity and improves light absorption, and is generally used in the production of polycrystalline silicon solar cells. Due to the disordered crystal orientation of polycrystalline silicon, it is impossible to obtain a pyramid-like surface structure through anisotropic etching to reduce reflectivity like monocrystalline silicon. Therefore, it is necessary to simply and effectively perform anti-reflection treatment on the surface to improve the photoelectric conversion efficiency of polycrystalline silicon solar cells. . [0003] The existing texture technology mainly includes the following methods: 1) mechanical etching (see li...

AI Technical Summary

Problems solved by technology

However, some of these methods have complex processing techniques and high costs, such as mechanical etching, RIE etching, and etching using porous silicon; some have simple processes, but poor anti-reflection effects, such as wet etching, etc.

[0004] To sum up, the existing texture technology has disadvantages such as high cost, complex process, or poor effect due to technological limitations.

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