The invention relates to
semiconductor processing equipment, and discloses
semiconductor quartz component cleaning equipment. The
semiconductor quartz component cleaning equipment comprises a rack, a placing table rotationally installed on the rack and provided with a lifting opening in the center, an outer
pipe wall cleaning device arranged on the rack and located on one side of the placing table, and an inner
pipe wall cleaning device arranged in the rack in a lifting mode and located below the lifting opening, wherein the inner
pipe wall cleaning device comprises a lifting table, a top
sprayer and side sprayers, the top
sprayer and the side sprayers are installed on the lifting table, the water outlet direction of the top
sprayer faces the upper portion of the rack, the water outlet direction of the side sprayers faces the side of the rack, and the side sprayers are distributed on the two sides of the top sprayer. According to the semiconductor
quartz component cleaning equipment, residual
dirt on the quartz component can be taken away along with
water flow in a flushing mode of top spraying water, so that the cleaning effect of the quartz component is greatly improved, and water spots are reduced.