Laser unit produced by using cleavable laser crystal
A technology of laser crystals and laser devices, which is applied in the direction of active dielectric materials, can solve problems such as difficulty in obtaining large-size rod-shaped laser gain media, and achieve the effects of overcoming the difficulty of processing, avoiding defects and impurities, and high smoothness
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example 1
[0012] Example 1: 5.6at% Nd pumped by 799nm semiconductor laser 3+ Activated cleavable La(BO 2 ) 3 The flake achieves 1060nm laser output.
[0013] La(BO 2 ) 3 The crystal belongs to the monoclinic system, the space group is C2 / c, and its unit cell parameters are a=9.946 Ȧ, b=8.163 Ȧ, c=6.497 Ȧ, α=γ=90°, β=127.06°, Z=4. The crystal can be Nd 3+ Ions are activated and can be cleaved along the (10 1) plane. At 799nm, Nd 3+ Ions have a strong absorption peak for light incident perpendicular to the cleavage plane, and the absorption cross section is 5.0×10 -20 cm 2 . to Nd 0.056 La 0.944 (BO 2 ) 3 The crystal peeled off a 200 μm thick sheet along the (10 1) cleavage plane. The surface smoothness of the sheet was 20 / 10, the flatness was less than 1 / 4 wavelength at 633nm wavelength, and the parallelism was about 10 seconds. Directly plate a dielectric film that is highly reflective to both the pump light and the fundamental wave laser on one of the cleaved end faces of...
example 2
[0014] Example 2: 5.6at% Nd pumped by 799nm semiconductor laser 3+ Activated cleavable La(BO 2 ) 3 The thin slice realizes frequency-doubling 530nm green laser output in the cavity.
[0015] Directly insert a nonlinear optical crystal (such as KTP, LBO, β-BBO, etc.) with a frequency doubling of 1060nm between the uncooled end face of the sheet in Example 1 and the output cavity mirror, and coat the output cavity mirror with high reflection at 1060nm, 530nm Highly transparent dielectric film. This is a 799nm semiconductor laser end-face or side-pumped 530nm green solid-state laser device with intracavity frequency doubling thin slice laser. The output cavity mirror can also be directly plated on the output end surface of the nonlinear optical crystal; or the sheet can be pasted with the nonlinear optical crystal, and the same purpose can be achieved by using a side pumping scheme.
example 3
[0016] Example 3: 5.6at% Nd pumped by 799nm semiconductor laser 3+ Activated cleavable La(BO 2 ) 3 The flake achieves 1060nm passive Q-switched pulsed laser output.
[0017] Directly Q-switching chip (such as Cr 4+ : YAG, GaAs, etc.) are inserted between the non-cooled end face of the sheet in Example 1 and the output cavity mirror, and the transmittance at 1060nm is plated on the output cavity mirror between 1% and 20% (determined according to the pump light power ) of the dielectric film. This is a 799nm semiconductor laser end-face or side-pumped passive Q-switched thin-sheet laser device that outputs 1060nm Q-switched pulsed laser. It is also possible to directly plate the output cavity mirror on the output end surface of the Q-switching chip; or paste the sheet and the Q-switching chip, and use a side pumping scheme to achieve the same purpose.
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