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Flexible low radiation window film and real time control method for producing the same

A low-radiation, real-time monitoring technology, applied in sputtering coating, ion implantation coating, metal material coating process, etc., can solve the problem of poor corrosion resistance of silver, lack of real-time monitoring means for low-radiation film, and the effect of isolating ultraviolet light To achieve the effect of good heat insulation, good visible light transmittance, corrosion resistance and weather resistance improvement

Inactive Publication Date: 2004-11-17
湖南三才光电信息材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The existing low-E film structure is generally S-M-S or S-M-S-M-S (that is, medium-metal-dielectric or medium-metal-medium-metal-medium), in which silver, copper, aluminum, etc. are generally used as the metal, and silver is mainly used for the medium; Oxides of titanium, zirconium, zinc, indium, tin, tungsten, etc., and nitrides of titanium, silicon, etc. are used. The combination of these film materials has a poor effect on blocking ultraviolet light.
At the same time, due to the poor corrosion resistance of silver, it brings a lot of inconvenience to the control of the production process, product transportation, storage and secondary processing of the product, and is also unfavorable to the service life of the product.
In addition, the lack of effective real-time monitoring means in the production of existing low-e film, resulting in unstable production process and product quality, needs to be improved

Method used

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  • Flexible low radiation window film and real time control method for producing the same
  • Flexible low radiation window film and real time control method for producing the same
  • Flexible low radiation window film and real time control method for producing the same

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Embodiment 1: as figure 1 As shown, the flexible substrate 1 is a PET film with a thickness of 75 μm; SiO x Layer 2 thickness 25nm, SSO x Layer 3 has a thickness of 5 nm; Ag(Au) layer 4 has a thickness of 14 nm, and Ag:Au=85:15 (weight ratio). Product performance: Visible light transmittance is 82%, radiation rate is 0.14, and ultraviolet light absorption rate is 95%.

Embodiment 2

[0030] Embodiment 2: as figure 2 As shown, the flexible substrate 1 is a PET film with a thickness of 23 μm; SiO x Layer 2 thickness 25μm, SSO x The thickness of layer 3 is 2 nm; the thickness of Ag(Au) layers 4 and 6 are both 9 nm, and Ag:Au=85:15 (weight ratio). The thicknesses of the ITO layers 5 and 7 are both 85nm.

[0031] Product performance: Visible light transmittance is 78%, radiation rate is 0.11, and ultraviolet light absorption rate is 90%.

Embodiment 3

[0032] Embodiment 3: see image 3 and Figure 4 , the real-time monitoring method process such as image 3 As shown in the block diagram, using the Figure 4 The multi-target magnetron sputtering roll-to-roll coating machine implementation of shown prior art, Figure 4 When the middle receiving (putting) material roller 23 rotates clockwise, it is a receiving roller, and when the receiving (releasing) material roller 21 rotates counterclockwise, it is a receiving roller. 1. Four light-emitting diode emitting probes (i.e., light-emitting probes 24) are evenly distributed horizontally on one side, and four light-receiving probes 20 are correspondingly arranged on the other side of the base film 1. The emitted light of the probes 24 is perpendicular to the running direction (plane) of the base film 1 , select the light transmittance of four wavelengths of 470nm, 560nm, 660nm, and 880nm for real-time monitoring, and the infrared transmittance of 880nm wavelength can judge wheth...

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Abstract

A flexible low radiation window film formed by plural layers coated on transparent flexible base material, wherein the Ag(Au) film is silver alloy comprising Ag and doped 15-20 wt% of homogeneous distribution Au. the real time window film monitoring method comprises arranging a plurality of light-emitting diode emission-receiving transducers on the material collecting roller on the multiple target magnetron sputtering coiling film plating machine in cross direction, whose output signals are magnified by amplifier and converted into digital information, and sent to one-chip computer for comparing and processing, and connected to the upper position through the interfaces, the target power output is controlled thus realizing the real time control for the continuous layer's film thickness.

Description

technical field [0001] The invention relates to a thin film material film system structure capable of reducing heat radiation rate and a production real-time monitoring method. Background technique [0002] The existing low-E film structure is generally S-M-S or S-M-S-M-S (that is, medium-metal-dielectric or medium-metal-medium-metal-medium), in which silver, copper, aluminum, etc. are generally used as the metal, and silver is mainly used for the medium; The oxides of titanium, zirconium, zinc, indium, tin, tungsten, etc., and the nitrides of titanium, silicon, etc. are used. The combination of these film materials has a poor effect on blocking ultraviolet light. At the same time, due to the poor corrosion resistance of silver, it brings a lot of inconvenience to the control of the production process, product transportation, storage and secondary processing of the product, and is also unfavorable to the service life of the product. In addition, there is a lack of effective...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/20C23C14/35C23C14/56
Inventor 彭传才李京增魏敏胡云慧余圣发钟碧城胡浩龙
Owner 湖南三才光电信息材料有限公司
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