Double-doped quantum dot active region epitaxial structure and preparation method and application thereof
A technology of quantum dot active region and epitaxial structure, which is applied to the field of double-doped quantum dot active region epitaxial structure and its preparation, can solve the problems of reducing the occupancy probability of quantum dot conduction band electrons, high power consumption, high heat and the like, Achieve the effect of improving material performance, reducing loss, and low threshold current
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[0050] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0051] figure 1 It is a schematic diagram of the double-doped quantum dot active region epitaxial structure.
[0052] Such as figure 1 As shown, the double-doped quantum dot active region epitaxial structure, the quantum dot active region 30 is configured as a periodic double-doped quantum dot stack structure, the quantum dot active region 30 includes: periodically arranged n-type doped impurity layer 31 and p-type doped layer 34 .
[0053] According to an embodiment of the present invention, the p-type doped layer 34 cooperates with the n-type doped layer 31 .
[0054] By forming a space-separated N-P-N~P-N-P alternately doped structure in the quantum dot active region 30, the non-radiative recombination center around...
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