Method for preparing silicon oxide based on silicon rod wire cutting waste
A technology of silicon oxide and wire cutting, applied in the field of silicon materials, achieves the effects of low cost, promotion of high-value utilization, and simple process
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Embodiment 1
[0037] This embodiment provides a method for preparing silicon oxide based on silicon rod wire cutting waste, the steps are as follows:
[0038] (1) Get 1g of submicron flake silicon waste produced by wire cutting of silicon rods, pickle with a mixed acid solution containing 5% hydrofluoric acid and 10% hydrochloric acid, the pickling temperature is 50°C, and the time is 10h, and then use Repeated washing with deionized water 5 times, vacuum drying;
[0039] (2) Place the silicon powder obtained after drying in step (1) in a box-type furnace in an air atmosphere, calcining and oxidizing at 940° C., keeping it warm for 1 hour, and the heating rate is 5° C. for γ minutes;
[0040] (3) Place the silicon powder obtained by oxidation in step (2) in a tube furnace for a centering reaction, in an argon atmosphere, at a pressure of 20 bar, calcining at 1200°C, heat preservation for 50 hours, and a heating rate of 5°C / min. A silicon oxide material is obtained.
[0041] It has been de...
Embodiment 2
[0044] This embodiment provides a method for preparing silicon oxide based on silicon rod wire cutting waste, the steps are as follows:
[0045] (1) Take 1g of the submicron flake silicon waste produced by wire cutting of silicon rods, pickle with a mixed acid solution containing 5% hydrofluoric acid and 10% hydrochloric acid, the pickling temperature is 50°C, and the time is 5h, and then use Nitric acid pickling with a concentration of 10%, the pickling temperature is 20°C, and the time is 0.5h, then pickling with a mixed acid solution containing 5% hydrogen peroxide and 10% hydrochloric acid, the pickling temperature is 20°C, the time is 10h, and finally Repeatedly washed 6 times with deionized water and dried in vacuum;
[0046] (2) Place the silicon powder obtained after drying in step (1) in a tube furnace in an atmosphere containing 40% water and 60% oxygen, and calcine and oxidize at 1200° C., keep the temperature for 45 hours, and the heating rate is 1° C. / min. A sili...
Embodiment 3
[0050] This embodiment provides a method for preparing silicon oxide based on silicon rod wire cutting waste, the steps are as follows:
[0051] (1) Get 1g of submicron flake silicon waste produced by wire cutting of silicon rods, pickle with a mixed acid solution containing 5% hydrofluoric acid and 10% hydrochloric acid, the pickling temperature is 50°C, and the time is 5h, and then use Pickling with a mixed acid solution containing 5% hydrogen peroxide and 10% hydrochloric acid, the pickling temperature is 20°C, the pickling time is 10h, and finally washed 5 times with deionized water repeatedly, and vacuum dried;
[0052] (2) Place the silicon powder obtained after drying in step (1) in a tube furnace in an air atmosphere, calcining and oxidizing at 800°C, keeping it warm for 1 hour, and the heating rate is 5°C / min;
[0053] (3) Place the silicon powder obtained by oxidation in step (2) in a tube furnace for neutralization reaction, in an argon atmosphere, with a pressure o...
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