Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for realizing infrared photoelectric detection by regulating and controlling metal/semiconductor Schottky junction through pyroelectric effect of polar semiconductor

A Schottky junction, semiconductor technology, applied in the direction of semiconductor devices, circuits, electrical components, etc., can solve the problems of unsuitability for large-scale application, complex electrode structure, complex device structure, etc., to achieve large band gap, high detection rate, Responsive effect

Pending Publication Date: 2021-11-02
SHANDONG UNIV
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In 1999, JudithA.Ruffner and others prepared an uncooled thin-film pyroelectric infrared detector with airgel thermal isolation, but the structure of this device is complex
In 2002, Chong et al. designed four SiN / SiO 2 Pyroelectric sensor array composed of pyroelectric sensing elements, but this method has complex device structure and low responsivity
In 2012, Chun-Yi Hsieh et al. used ZnO / PZT to form a heterojunction, combined the photocurrent behavior in the ultraviolet range and the pyroelectric effect in the infrared range, and obtained a wide spectral response of the current, but this method device The structure is more complex and the responsiveness is lower
In 2017, Da Yuezhi provided a small pyroelectric infrared detection element that reliably detects multiple types of detection objects, but the device has a complex structure and low responsivity
In 2018, Hideki Fujiwara designed a new pyroelectric infrared detector, whose response sensitivity has a great relationship with the electrode structure, so the electrode structure is more complicated
In 2019, Ying Wang et al. used the pyroelectric effect of ZnO to enhance the transient photoresponse of Ag / ZnO. Although this method has high responsivity, the response wavelength is limited to the ultraviolet band.
This type of infrared detector requires a multi-layer structure, and the preparation of the device is relatively complicated, which is not suitable for large-scale applications, and the substrate material needs to have a high absorption rate for infrared light, and the material restrictions are large.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for realizing infrared photoelectric detection by regulating and controlling metal/semiconductor Schottky junction through pyroelectric effect of polar semiconductor
  • Method for realizing infrared photoelectric detection by regulating and controlling metal/semiconductor Schottky junction through pyroelectric effect of polar semiconductor
  • Method for realizing infrared photoelectric detection by regulating and controlling metal/semiconductor Schottky junction through pyroelectric effect of polar semiconductor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] A method for regulating a metal / semiconductor Schottky junction through the pyroelectric effect of a polar semiconductor to realize infrared photodetection, comprising the following steps:

[0041] (1) Place the unintentionally doped sapphire substrate GaN on the sputtering table of the sputtering instrument, and use the ion sputtering coating method to deposit the gold film by ion sputtering through the template method. The sputtering target is a gold target, and the vacuum degree is for 10 -1 mbar, the current is 6mA, and the sputtering time is 120s; a gold electrode with a length of 2mm and a width of 1mm is made.

[0042] (2) Place the GaN film on the gold electrode sputtered in step (1) with 60 μW / cm 2 , In a 365nm ultraviolet light atmosphere, test its initial current at -5V-5V.

[0043] (3) Under the conditions of step (2), process under different optical power 1064nm infrared light, the free electrons excited by ultraviolet light absorb infrared light and gene...

Embodiment 2

[0050] According to the method of embodiment 1, the metal / semiconductor Schottky junction is regulated and controlled through the pyroelectric effect of the polar semiconductor to realize infrared photodetection, and adopt figure 2 The experimental setup shown was tested at 60μW / cm 2 , 365nm ultraviolet light atmosphere, at 50mW / cm 2 , 1064nm infrared light switches in a period of 100s to detect the current change of the sample, the test results are as follows Figure 6 shown.

[0051] Depend on Figure 6 It can be seen that during the infrared switching process, the response speed of the sample reaches 0.5s, and the sample has good repeatability and stability.

Embodiment 3-7

[0053] Change the polar wide bandgap semiconductor material and Schottky junction material, as well as the power density of infrared light irradiation, as shown in Table 1.

[0054] Table 1

[0055] Item Number Example 3 Example 4 Example 5 Example 6 Example 7 Polar Wide Bandgap Semiconductor Materials Zinc oxide aluminum nitride Cadmium sulfide gallium oxide Silicon carbide Schottky junction material silver platinum gold silver platinum Infrared light irradiation power density mW / cm 2

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Power densityaaaaaaaaaa
Login to View More

Abstract

The invention relates to a method for realizing infrared photoelectric detection by regulating and controlling a metal / semiconductor Schottky junction through a pyroelectric effect of a polar semiconductor. A metal electrode is prepared on the surface of a polar semiconductor material, a Schottky junction is formed on the surface of a semiconductor, ultraviolet light is utilized to excite free electrons to improve infrared light absorption of the semiconductor, infrared light is utilized to excite a pyroelectric field of the polar semiconductor, and the pyroelectric field is utilized to regulate and control the junction height of the Schottky junction of a heterogeneous interface to regulate and control a light current. Therefore, infrared light detection is realized. The method is easy to operate and low in equipment requirement, large-area operation of the semiconductor material can be achieved, surface modification of the semiconductor material cannot reduce the light responsivity of the semiconductor material, and the method can be suitable for various semiconductor materials with polarity. According to the invention, the regulation and control effect is obvious, the responsivity of the device reaches 13mA / W, the response speed reaches 0.5 s, and the performance of the device has good stability and repeatability.

Description

technical field [0001] The invention proposes a method for regulating the metal / semiconductor Schottky junction through the pyroelectric effect of the polar semiconductor to realize infrared photoelectric detection. Background technique [0002] The pyroelectric detector is prepared according to the pyroelectric effect. In order to maintain the neutral state of the surface of some materials, the surface of the material will absorb a certain charge. When the surface of the material is subjected to thermal radiation and the temperature changes, the electric dipole moment of these materials will also change accordingly. In order to maintain its electrically neutral state, the surface of the pyroelectric material will release charges, and the pyroelectric voltage is This phenomenon is called the pyroelectric effect. Generally speaking, the common pyroelectric materials are mostly ferroelectric materials, such as PbZrTiO 3 , LiTaO 3 , or BaSrTiO 3 . However, these material...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L31/108H01L31/18
CPCH01L31/1085H01L31/18Y02P70/50
Inventor 刘铎赵超鹏颜为山
Owner SHANDONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products