Metal grid flexible conductive film and manufacturing method thereof

A metal grid, flexible and conductive technology, applied in the field of conductive film, can solve the problems of insufficient lightness and flexibility of the finished product, and achieve the effect of stable product performance, reduced material usage, and excellent touch and vision.

Active Publication Date: 2021-09-14
江苏软讯科技有限公司
View PDF8 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the existing commercial products and patents, the metal mesh thickness of the touch sensor is generally 1.5-5um, which is generally thick, and the finished product is not light enough, and it is all made of metal materials, which is not flexible enough.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metal grid flexible conductive film and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] (1) Coating: The catalyst is prepared by mixing palladium catalyst, pure water, solvent and active agent, heating and stirring; take a flexible transparent substrate, coat the catalyst on both its upper and lower sides to form a catalyst layer, and coat the surface of the catalyst layer with Cloth photoresist, form photoresist coating layer, make substrate A;

[0045] (2) Exposure: Place substrate A obtained in step (1) under a photomask for exposure treatment, the wavelength of ultraviolet light is 314nm, and the exposure energy is 50mJ / cm 2 , the lighted area in the photoresist coating layer is cured to obtain the substrate B;

[0046] (3) Developing: Get the substrate B obtained in step (2) and place it in a developing solution for developing treatment, remove the unilluminated part in the photoresist coating layer, and form a photoresist layer with grooves. The catalyst layer is exposed to form a circuit pattern, and a substrate C is obtained; wherein the developin...

Embodiment 2

[0051] (1) Coating: The catalyst is prepared by mixing palladium catalyst, pure water, solvent and active agent, heating and stirring; take a flexible transparent substrate, coat the catalyst on both its upper and lower sides to form a catalyst layer, and coat the surface of the catalyst layer with Cloth photoresist, form photoresist coating layer, make substrate A;

[0052] (2) Exposure: the base material A obtained in step (1) is placed under a photomask for exposure treatment, the wavelength of ultraviolet light is 314nm, and the exposure energy is 65mJ / cm 2, the illuminated area in the photoresist coating layer is cured, and the Obtain substrate B;

[0053] (3) Developing: Get the substrate B obtained in step (2) and place it in a developing solution for developing treatment, remove the unilluminated part in the photoresist coating layer, and form a photoresist layer with grooves. The catalyst layer was exposed to form a circuit pattern, and the substrate C was obtained; ...

Embodiment 3

[0058] (1) Coating: The catalyst is prepared by mixing palladium catalyst, pure water, solvent and active agent, heating and stirring; take a flexible transparent substrate, coat the catalyst on both its upper and lower sides to form a catalyst layer, and coat the surface of the catalyst layer with Cloth photoresist, form photoresist coating layer, make substrate A;

[0059] (2) Exposure: the base material A obtained in step (1) is placed under a photomask for exposure treatment, the wavelength of ultraviolet light is 365nm, and the exposure energy is 80mJ / cm 2 , the illuminated area in the photoresist coating layer is cured, and the Obtain substrate B;

[0060] (3) Developing: Get the substrate B obtained in step (2) and place it in a developing solution for developing treatment, remove the unilluminated part in the photoresist coating layer, and form a photoresist layer with grooves. The catalyst layer is exposed to form a circuit pattern, and the substrate C is obtained; w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a metal grid flexible conductive film and a manufacturing method thereof, the metal grid flexible conductive film comprises a base material, a catalyst layer is arranged on the surface of the base material, a protective layer is arranged on one side, away from the base material, of the catalyst layer, and a metal grid is arranged between the catalyst layer and the protective layer. The circuit pattern is formed through exposure and development of the photoresist, the line width of the metal grid and the distance between the adjacent circuits can be accurately controlled, and the effects of good touch control and vision are achieved; the thickness of the metal layer is accurately controlled by using a chemical copper plating process, so that the conductive film product is light and thin; the metal layer is generated in the groove in the photoresist layer, so that the risk that the copper circuit is scratched by the transmission roller in the roll-to-roll production process can be effectively reduced, the conductivity of the metal circuit is ensured, the protective layer formed by coating the outermost layer plays a role in protecting the whole circuit, and the stable product performance is ensured.

Description

technical field [0001] The invention relates to the technical field of conductive films, in particular to a metal grid flexible conductive film and a manufacturing method thereof. Background technique [0002] At present, the most commonly used conductive film material in transparent electrodes such as liquid crystal displays, plasma displays, electroluminescent displays, and touch screens on the market is ITO (indium tin oxide), of which metal indium is a rare metal, and its storage capacity in nature is very low. , while the content of indium metal in ITO is about 75%. The cost of the conductive film made of ITO is relatively high, and the sustainability of the industry is doubtful. In addition, there are many problems in the ITO material itself and the preparation process. With the diversified development of global smart terminals, the market demand for high-end display screens is increasing. As a new generation of display technology, flexible display has become a hot s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G06F3/044
CPCG06F3/0446G06F2203/04102G06F2203/04112
Inventor 丁力谢才兴
Owner 江苏软讯科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap