Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of SIC-based tungsten disulfide ultraviolet-visible photodetector and its preparation method and application

A photodetector, tungsten disulfide technology, applied in the field of ultraviolet-visible detection, can solve the problems of reducing the photosensitive area of ​​materials, reducing device sensitivity, specific detection rate and response time, prolonging the transmission distance of photogenerated carriers, and achieving enhanced Photoelectric detection performance, beneficial to commercial promotion, and the effect of promoting application development

Active Publication Date: 2022-03-11
ZHEJIANG XINKE SEMICON CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, W 2 Most photodetectors are still based on SiO 2 / Si substrate and top metal-semiconductor contact, which greatly limits the further improvement of its electrical and optoelectronic properties
At the same time, most of the previous heterojunction stacks are WS 2 Combined with other two-dimensional materials, Si, GaAs, etc., these devices generally only use the conductivity and light absorption of another component, and do not achieve the effect of multifunctional regulation of optoelectronic properties
Most importantly, devices fabricated on materials with photolithographic patterns are prone to problems such as Fermi level pinning at the metal-semiconductor interface, resulting in large dark current, low open-circuit current density, and large noise The equivalent power also reduces the photosensitive area of ​​the material and prolongs the transmission distance of photogenerated carriers, thereby reducing the sensitivity, specific detectivity and response time of the device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of SIC-based tungsten disulfide ultraviolet-visible photodetector and its preparation method and application
  • A kind of SIC-based tungsten disulfide ultraviolet-visible photodetector and its preparation method and application
  • A kind of SIC-based tungsten disulfide ultraviolet-visible photodetector and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] 1. Preparation:

[0037] (1) cleaning n - SiC(11μm) / n + SiC (360 μm) substrate. Ultrasonic the substrate with acetone, isopropanol, and deionized water for 20 minutes; then pass in oxygen with a flow rate of 50 sccm, and the power of the plasma is 100 W, and generate ozone for cleaning for 5 minutes;

[0038] (2) According to 49% hydrofluoric acid (HF) aqueous solution: 40% ammonium fluoride (NH 4 F) Aqueous solution = 1:6 (volume ratio) mixed to configure a buffered oxide etchant (BOE) solution. Washed n from step 1 - SiC(11μm) / n + Put the SiC (360 μm) substrate into the buffered oxide etching solution (BOE) solution for 4 minutes to etch the oxide on the surface of the SiC substrate;

[0039] (3) Use electron beam evaporation equipment to evaporate the back electrode Ni-Ag to the substrate n + SiC (360μm) surface, and then spin-coated as a positive photoresist of the German ALLRESISTARP-5350 model on n - On the SiC (11μm) surface, set the speed of the homogeni...

Embodiment 2

[0046] The difference from embodiment 1 is that: the back electrode is Ti-Au; the symmetrical electrode is Au.

Embodiment 3

[0048] The difference from Example 1 is that: the back electrode is Cr—Au.

[0049] The present invention combines WS for the first time 2 n transferred to the evaporated symmetric electrode - SiC(11μm) / n + On SiC (360μm) substrates, the Fermi level pinning effect at the metal-semiconductor interface is weakened, and SiC and WS are synergistically exerted 2 Both UV-Vis absorption properties. Realized highly sensitive ultraviolet-visible detection function under 405nm laser irradiation (photosensitivity up to 60A / W, specific detection rate up to 4.94×10 11 Jones, external quantum efficiency 238%). The SiC-based tungsten disulfide ultraviolet photodetector of the present invention has a larger optical switch ratio (10 4 ), fast photoresponse (20~40ms), high sensitivity (R up to 60A / W, specific detection rate up to 5×10 11 Jones, with an external quantum efficiency of 238%), and has a bottom-gate regulated WS 2 specialty.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
external quantum efficiencyaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of ultraviolet-visible detection, and discloses a SiC-based tungsten disulfide ultraviolet-visible photodetector as well as a preparation method and application thereof. The structure of the detector is the back electrode / n + SiC(360μm) / n ‑ SiC(11μm) / symmetric electrode / WS 2 nanosheets; the detectors are first on SiO 2 Fabrication of micron-sized irregular WS on Si substrate by mechanical exfoliation 2 nanosheets; and then through the PVA dry transfer process, the WS 2 transferred to the SiC substrate on which symmetrical electrodes have been deposited by a photolithographic evaporation process, and finally the WS 2 / The SiC substrate of the PVA film is heated in deionized water or dimethyl sulfoxide at 50-60°C to dissolve the PVA film; it is obtained by annealing at 100-250°C in a protective atmosphere. The invention improves the WS 2 The performance of the detector has promoted the application and development of SiC-based two-dimensional material functional devices, and is conducive to commercial promotion.

Description

technical field [0001] The invention belongs to the technical field of ultraviolet-visible detection, and more specifically relates to a SiC-based tungsten disulfide ultraviolet-visible photodetector and its preparation method and application. Background technique [0002] Photoelectric detection technology is one of the many technologies that affect modern human life. Optoelectronic devices with high sensitivity, low noise, fast response and wide-spectrum detection are urgent requirements for enriching and facilitating people's daily life; SiC is the third-generation wide bandgap semiconductor. , has the advantages of high thermal conductivity, high breakdown field strength, high saturation electron migration rate, and good UV-Vis detection. In the dark, SiC can act as an insulator as the dielectric layer of the device; under suitable light, SiC can act as a semiconductor as the epitaxial photosensitive layer of the device. However, at present, SiC-based photodetectors are...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/101H01L31/113H01L31/0224H01L31/18
CPCH01L31/1013H01L31/1136H01L31/022408H01L31/18Y02P70/50
Inventor 李京波张帅高伟张峰岳倩郑涛
Owner ZHEJIANG XINKE SEMICON CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com