Low-voltage multifunctional charge trapping synaptic transistor and preparation method thereof
A charge trapping and transistor technology, applied in the field of charge trapping synaptic transistors, can solve the problems of high operating voltage, single function, lack of simulation of short-term plasticity, etc., and achieve the effect of enhancing the interface electric field and improving efficiency
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[0042] The present invention will be described in detail below through specific examples in conjunction with the accompanying drawings.
[0043] Such as Figure 1 to Figure 8 As shown, a low-voltage multifunctional charge-trapping synaptic transistor was fabricated according to the following steps:
[0044] 1) Thinning the silicon film of the SOI substrate, the specific operation method is dry oxygen oxidation or hydrogen-oxygen synthesis to oxidize the surface silicon film to form a silicon oxide film, and then rinse the surface silicon oxide film with hydrofluoric acid solution, and then spin Coated with HSQ electron beam glue, such as figure 1 shown. It is also possible to use a bulk silicon substrate, and then deposit a silicon oxide film and a polysilicon film in sequence to form an SOI substrate.
[0045] 2) Using electron beam lithography to define the nanowire mask, the width of the nanowire mask is the line width of the subsequent silicon nanowires, such as figu...
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