Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Vacuum arc-extinguishing chamber contact material surface coating and processing method thereof

A vacuum interrupter and contact material technology, applied in the field of sputtering coating, can solve the problems of large Cr phase size, uneven distribution, composition segregation, etc., and achieve high density, easy release of electrons, accurate and reliable composition control effect

Active Publication Date: 2020-04-28
XI AN JIAOTONG UNIV
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the traditional CuCr alloy preparation process often has problems such as low density, large and uneven distribution of Cr phase, and serious composition segregation. The method of alloying or doping can improve the uniformity of the structure to a certain extent. The size of the refined phase

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vacuum arc-extinguishing chamber contact material surface coating and processing method thereof
  • Vacuum arc-extinguishing chamber contact material surface coating and processing method thereof
  • Vacuum arc-extinguishing chamber contact material surface coating and processing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] A method for treating the surface coating of a contact material of a vacuum interrupter provided by the present invention comprises the following steps:

[0035] 1) Clean and dry the CuCr alloy contact material substrate, and clean the equipment.

[0036] 2) Sputtering a CuCrMo alloy film on the surface of the CuCr alloy contact material by using a magnetron sputtering method, and finally obtaining a substrate on which the CuCrMo alloy film grows.

[0037] Specifically, in step 1), the substrate was ultrasonically cleaned with absolute ethanol and deionized water for 10 minutes, and then dried with high-purity nitrogen with a purity of 99.99%. The JPG-450a double-chamber magnetron sputtering The equipment first uses the vacuum equipment to remove the dust in the cavity, and then uses absolute ethanol to scrub the inner wall of the cavity.

[0038] In step 2), the CuCrMo alloy film is sputtered by JPG-450a double-chamber magnetron sputtering equipment. The target is pl...

Embodiment 2

[0043] A method for treating the surface coating of a contact material of a vacuum interrupter provided by the present invention comprises the following steps:

[0044] 1) Clean and dry the CuCr alloy contact material substrate, and clean the equipment.

[0045] 2) Sputtering a CuCrMo alloy film on the surface of the CuCr alloy contact material by using a magnetron sputtering method, and finally obtaining a substrate on which the CuCrMo alloy film grows.

[0046] Specifically, in step 1), the substrate was ultrasonically cleaned with absolute ethanol and deionized water for 15 minutes, and then dried with high-purity nitrogen with a purity of 99.99%. The JPG-450a double-chamber magnetron sputtering The equipment first uses the vacuum equipment to remove the dust in the cavity, and then uses absolute ethanol to scrub the inner wall of the cavity.

[0047] In step 2), the CuCrMo alloy film is sputtered by JPG-450a double-chamber magnetron sputtering equipment. The target is pl...

Embodiment 3

[0051] A method for treating the surface coating of a contact material of a vacuum interrupter provided by the present invention comprises the following steps:

[0052] 1) Clean and dry the CuCr alloy contact material substrate, and clean the equipment.

[0053] 2) Sputtering a CuCrMo alloy film on the surface of the CuCr alloy contact material by using a magnetron sputtering method, and finally obtaining a substrate on which the CuCrMo alloy film grows.

[0054] Specifically, in step 1), the substrate was ultrasonically cleaned with absolute ethanol and deionized water for 12 minutes, and then dried with high-purity nitrogen with a purity of 99.99%. The JPG-450a double-chamber magnetron sputtering The equipment first uses the vacuum equipment to remove the dust in the cavity, and then uses absolute ethanol to scrub the inner wall of the cavity.

[0055] In step 2), the CuCrMo alloy film is sputtered by JPG-450a double-chamber magnetron sputtering equipment. The target is pl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a vacuum arc-extinguishing chamber contact material surface coating and a processing method thereof. The method adopts a metal copper-chromium molybdenum target material for forming a CuCrMo alloy film on a CuCr alloy contact material substrate, wherein the CuCrMo alloy film comprises the following components of, by mass, 25%-55% of Cr, 5%-9% of Mo, and the balance Cu. Themethod specifically comprises the following steps that 1, the CuCr alloy contact material substrate is ground and polished; 2, the ground and polished CuCr alloy contact material substrate is cleanedand blow-dried; and 3, the surface of the CuCr alloy contact material substrate subjected to cleaning and blow-drying is coated with the CuCrMo alloy film by adopting a magnetron sputtering method, and finally the CuCr alloy contact material substrate with the CuCrMo alloy film grown is obtained. The coating prepared through the processing method has the thickness of 1-20 microns. Compared with the CuCr35, the CuCrMo alloy film prepared through the processing method has higher voltage resistance strength, lower chopping values and longer arcing time.

Description

technical field [0001] The invention belongs to the technical field of sputtering plating, and in particular relates to a surface coating of a vacuum interrupter contact material and a processing method thereof. Background technique [0002] Vacuum circuit breakers are important components for segmenting currents in power systems and protecting power equipment. The trend of the development of vacuum interrupters in the direction of miniaturization, large capacity, and high voltage has put forward higher requirements for the performance of the key components of the electrical contacts. Require. The electrical contacts produced by the traditional contact material preparation process can no longer meet the increasing performance requirements in the power system. Therefore, the preparation of electrical contact materials with stronger arc ablation resistance and longer service life has become the development of vacuum circuit breakers. It is one of the key technologies and core...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/16C23C14/35C22C9/00C22C27/06C22C30/02
CPCC22C9/00C22C27/06C22C30/02C23C14/165C23C14/352
Inventor 宋忠孝李玉楼崔笑千张娜李雁淮朱晓东
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com