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Cycloolefin copolymer microlens array with metal diaphragm and preparation method thereof

A cyclic olefin copolymer and microlens array technology, which is applied in the directions of lenses, optomechanical equipment, and the photoengraving process of the pattern surface, can solve the problem that the dimensional accuracy and shape of optical microlenses are not easy to guarantee, and the processing and integration of supporting apertures are complicated. , long production cycle and other problems, to achieve the effect of good array uniformity and repeatability, cost and time saving, and short processing time

Active Publication Date: 2021-02-12
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to solve the problems of long production cycle, high processing cost, low efficiency, and difficulty in ensuring the dimensional accuracy and shape of the optical microlens existing in the existing mold hot pressing method, and at the same time solve the problem of complex processing and integration of the supporting aperture, the present invention provides a Cycloolefin copolymer microlens array with metal diaphragm and preparation method thereof

Method used

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  • Cycloolefin copolymer microlens array with metal diaphragm and preparation method thereof
  • Cycloolefin copolymer microlens array with metal diaphragm and preparation method thereof
  • Cycloolefin copolymer microlens array with metal diaphragm and preparation method thereof

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[0048] The invention provides a cycloolefin copolymer microlens array with a metal diaphragm and a preparation method thereof.

[0049] In a first aspect, the present invention provides a cycloolefin copolymer microlens array with a metal diaphragm, comprising the steps of:

[0050] S101, using the first photolithography mask to form a first photoresist mask with a microlens array pattern on the surface of the silicon wafer substrate by photolithography;

[0051] S102, using an etching method to etch the first photoresist mask to etch a silicon wafer microhole array on the silicon wafer substrate;

[0052] S103. After paving the cycloolefin copolymer layer on the micropore array of the silicon chip, heat and press, cool, separate the micropore array of the silicon chip from the cycloolefin copolymer layer, and invert the cycloolefin copolymer layer to obtain the first cycloolefin copolymer arrays;

[0053] S104. Using a second photolithography mask to form a second photoresi...

Embodiment 1

[0070] The method for preparing the cycloolefin copolymer microlens array with metal diaphragm provided by the present invention may specifically comprise the following steps:

[0071] (1) Spin-coat positive photoresist on the surface of the silicon wafer substrate, use the first photolithography mask to expose and develop, and form a patterned first photoresist mask on the surface of the silicon wafer substrate, the first photolithography The patterns on the glue mask are photoresist microlens array patterns.

[0072] (2) by dry etching the silicon wafer substrate with the first photoresist mask, form the same diameter with the photoresist microlens array pattern diameter on the silicon wafer substrate with the first photoresist mask Microhole arrays on silicon wafers, and passivation treatment on the surface of microhole arrays on silicon wafers.

[0073] (3) Put the cycloolefin copolymer and the passivated silicon wafer micropore array into a hot press, place a spacer ring...

Embodiment 2

[0080] The method for preparing the cycloolefin copolymer microlens array with metal diaphragm provided by the present invention may specifically comprise the following steps:

[0081] (1) Spin-coat positive photoresist on the surface of the silicon wafer substrate, use the first photolithography mask to expose and develop, and form a patterned first photoresist mask on the surface of the silicon wafer substrate, the first photolithography The patterns on the glue mask are photoresist microlens array patterns.

[0082] (2) by dry etching the silicon wafer substrate with the first photoresist mask, form a diameter identical to the photoresist microlens array pattern diameter on the silicon wafer substrate with the first photoresist mask Microhole arrays on silicon wafers, and passivation treatment on the surface of microhole arrays on silicon wafers.

[0083] (3) Put the cycloolefin copolymer and the passivated silicon chip micropore array into a hot press, place a spacer ring...

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Abstract

The invention discloses a cycloolefin copolymer microlens array with a metal diaphragm and a preparation method thereof. The preparation method disclosed in the present invention includes the steps: S101, using the first photolithography mask to form a first photoresist mask on the surface of the silicon wafer substrate by photolithography; S102, etching silicon wafer micropores on the silicon wafer substrate Array; S103. After paving the cycloolefin copolymer layer on the microwell array of the silicon wafer, heat and press to obtain the first cycloolefin copolymer array; S104. Using the reverse photolithography method to utilize the second photolithography mask Forming a second photoresist mask on the cycloolefin copolymer array to obtain a second cycloolefin copolymer array; S105, evaporating a layer of metal on the structural surface of the second cycloolefin copolymer array to obtain the second cycloolefin copolymer array Tricyclic olefin copolymer array; S106. Put the third cycloolefin copolymer array into acetone solution to obtain a cycloolefin copolymer microlens array with a metal diaphragm.

Description

technical field [0001] The invention relates to the technical field of micromachining, in particular to a cycloolefin copolymer microlens array with a metal diaphragm and a preparation method thereof. Background technique [0002] The microlens array is an array composed of lenses with a clear aperture and a sagittal depth of microns. It has basic imaging functions such as traditional lens focusing and imaging, and can also be used for modulation functions such as wavefront sensing and beam shaping. It is widely used in optical communications. and optoelectronics. According to the substrate, the microlens array is mainly divided into quartz glass material and polymer material. Microlens arrays made of glass are expensive, complex in processing technology, and difficult to integrate with the system. COC (Cyclic Olefin Copolymer) produced by TOPAS, as an improved material of traditional materials, has optical properties comparable to PMMA (polymethyl methacrylate, acrylic re...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B3/00G03F7/00G02B1/04
CPCG02B1/041G02B3/0012G02B3/0031G03F7/0005
Inventor 刘永顺连高歌张平吴一辉
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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