Alloy target material containing rare earth elements and preparation method thereof

A technology of rare earth elements and alloy targets, which is applied in the field of alloy targets containing rare earth elements and its preparation, which can solve the problem of difficulty in ensuring the uniformity of composition and structure in alloys, and the difficulty in obtaining high-quality and high-density targets and hot-pressed targets Uneven density distribution and other problems, to achieve the effect suitable for large-scale industrial production and application, with many specifications and sizes, and fine grains

Inactive Publication Date: 2019-09-20
河北宏靶科技有限公司
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the alloy target containing rare earth elements is manufactured by vacuum melting and casting method, shrinkage cavity, porosity and macro segregation are easy to occur during the casting process, and the uniformity of composition and structure in the alloy is difficult to guarantee
However, when using the hot pressing method to manufacture alloy targets containing rare earth elements, it is difficult to achieve large-scale target production. At the same time, the internal density distribution of the hot pressing target is not uniform, and the difference between the center and the edge density is as high as 5%. It is difficult to obtain high quality and high density. target

Method used

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  • Alloy target material containing rare earth elements and preparation method thereof

Examples

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preparation example Construction

[0028] see figure 1 , a preparation method of an alloy target containing rare earth elements provided by the present invention, comprising the following steps:

[0029] S100: In atomic percentage, mix 30-80at% aluminum powder, 1-30% titanium powder, 1-30% chromium powder, 1-20at% silicon powder, and 0.1-10at% rare earth powder;

[0030] S200: cold isostatic pre-pressing the mixed powder in a cold isostatic pressing mold to obtain a cold isostatic compact;

[0031] S300: put the cold isostatic pressed compact into a pure aluminum sheath, and place it in a degassing furnace for degassing;

[0032] S400: sealing and welding the degassed sheath into a hot isostatic pressing device to press and sinter an ingot;

[0033] S500: Machining and cleaning the ingot to obtain the required finished target material.

[0034] Wherein, the purity of the aluminum powder, titanium powder, chromium powder, silicon powder, and rare earth powder is above 99.5%, the particle diameter of the alumi...

example 1

[0042] The aluminum-chromium-titanium-silicon-yttrium alloy target of the present invention is made of the following atomic percentages of raw materials: 75% aluminum, 10% titanium, 9% chromium, 5.5% silicon, and 0.5% yttrium oxide; the preparation method of the alloy target in this example, Include the following steps:

[0043] (1) Take by weighing 99.5% purity, chromium powder and titanium powder with an average particle size of 75 μm, aluminum powder with an average particle size of 63 um, silicon powder with an average particle size of 45 um, and yttrium oxide powder with an average particle size of 40 um in three-dimensional Mix in the mixer for 3 hours, and fill with high-purity argon for protection during the mixing process;

[0044] (2) Pack the mixed powder into the cold isostatic pressing molding mold and carry out cold isostatic pressing pre-compression molding, the pressure of cold isostatic pressing is 100MPa, and the pressure is maintained for 10 minutes;

[004...

example 2

[0050] The aluminum-chromium-titanium-silicon-cerium alloy target of the present invention is made of the raw materials of the following atomic percentages: aluminum 65%, titanium 15%, chromium 10%, silicon 5%, cerium 5%; the preparation method of the alloy target of this example includes the following step:

[0051] (1) Take by weighing 99.5% purity, chromium powder and titanium powder with an average particle diameter of 80 μm, aluminum powder with an average particle diameter of 65 μm, silicon powder with an average particle diameter of 45 μm, and cerium powder with an average particle diameter of 45 μm in a three-dimensional mixing Mix in the feeder for 3 hours, and fill in high-purity argon for protection during the mixing process;

[0052] (2) Pack the mixed powder into the cold isostatic pressing molding mold and carry out cold isostatic pressing pre-compression molding, the pressure of cold isostatic pressing pre-compression is 80MPa, and the pressure is maintained for...

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Abstract

The invention provides an alloy target material containing rare earth elements. The alloy target material comprises the following components of 30at%-80at% of aluminum, 1at%-30at% of titanium, 1at%-30at% of chromium, 1at%-20at% of silicon and 0.1at%-10at% of rare earth. A provided preparation method of the alloy target material containing the rare earth elements comprises the following steps that the chromium powder, the aluminum powder, the titanium powder, the silicon powder and the rare earth powder are uniformly mixed firstly, cold isostatic pressing pre-pressing forming is performed, then sleeving, degassing and hot isostatic pressing sintering are performed, and finally machining is performed on an obtained ingot blank to obtain the required alloy target material. The provided alloy target material containing the rare earth elements has the advantages of being high in density, free of air pores, free of looseness and segregation, fine and small in crystal grain, uniform in structure and suitable for sputtering use of hard coatings required by various tools and molds.

Description

technical field [0001] The invention relates to the technical field of alloy targets, in particular to an alloy target containing rare earth elements and a preparation method thereof. Background technique [0002] Hard coating technology is an important means of material surface modification. Coating technology can use some physical or chemical means to coat a The layer has a thin film with specific required properties, which can greatly improve the heat resistance, corrosion resistance, oxidation resistance, wear resistance and other properties of the material, while the matrix still maintains its original good mechanical properties. [0003] In the 1980s, titanium nitride was almost the only commercially available hard material. Although TiN thin film has the advantages of high hardness and wear resistance, as the application deepens, some of its properties show shortcomings, such as The bonding force between the film and the substrate is poor, and the operating temperatu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22C32/00C22C30/00C22C21/00C22C1/05C22C1/04
CPCC22C1/04C22C1/0416C22C1/05C22C21/00C22C30/00C22C32/001C23C14/325
Inventor 姜海唐培新吕晓明姜慧王瑞刚许凤志
Owner 河北宏靶科技有限公司
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