Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Reverse Conduction Insulated Gate Bipolar Transistor

A bipolar transistor, insulated gate technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problem of reducing device breakdown voltage, extending the current path length of electrons in the n-type field stop layer 105, and exacerbating the problem. Problems such as uneven current distribution inside the device to achieve the effect of improving reliability

Active Publication Date: 2021-10-22
安建科技(深圳)有限公司
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This turn-on voltage foldback phenomenon has a huge negative impact on the reliability of RC-IGBT applications
For example, for multiple parallel-connected RC-IGBTs or RC-IGBTs with a large chip area, due to the deviation of chip processing technology, the The voltage return point of the chip is often not consistent, which leads to the current concentrated flow to a single chip or a certain local area of ​​a single large chip, causing the chip to be burned due to excessive current
[0006] In order to avoid the turn-on voltage foldback phenomenon, it is necessary to enable the PN junction between the p-type collector layer 106 and the n-type field stop layer 105 of the RC-IGBT to be opened under the lowest possible forward voltage drop of the device. Common methods include: (a) increasing n - The doping concentration of the drift region 101 or reduce n - The thickness of the drift region 101 to reduce n - The resistance of the drift region, but this method will reduce the breakdown voltage of the device; (b) reduce the doping concentration or thickness of the n-type field stop layer 105, and increase the resistance of the n-type field stop layer 105 on the electron current path, so as to increase p + The potential difference of the PN junction between the collector region 106 and the n-type field stop layer 105 enables the above-mentioned PN junction to be opened at a lower electron current, but this method also reduces the breakdown voltage of the device; (c) Extend the current path length of electrons in the n-type field stop layer 105, that is, increase the adjacent n + The interval of the cathode region 107 can also improve the resistance of the n-type field stop layer 105 on the electron current path, increasing the p + The potential difference of the PN junction between the collector region 106 and the n-type field stop layer 105, but this method will aggravate the inhomogeneity of the current distribution inside the device and increase the forward conduction loss of the device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Reverse Conduction Insulated Gate Bipolar Transistor
  • A Reverse Conduction Insulated Gate Bipolar Transistor
  • A Reverse Conduction Insulated Gate Bipolar Transistor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] Device 002 is an RC-IGBT device according to the first embodiment of the present invention. Similar to the RC-IGBT device 001 in the prior art, the device 002 of the present invention is a trench-gate device, that is, its front side has a series of strip-shaped trenches arranged in parallel. Figure 4 It is a schematic diagram of the area division on the back of the device 002. With reference to the arrangement direction of the grooves on the front of the device, the back of the device 002 is divided into four types of rectangular areas: A, B, C, and D. Among them, area A 21 is located in the middle of the back of the device 002, The direction of the connection line between the center of B area 22 and the center of A area 21 is perpendicular to the arrangement direction of the trenches on the front of the device; the direction of the connection line between the center of C area 23 and the center of A area 21 is at an angle of 45 degrees to the arrangement direction of th...

Embodiment 2

[0050] Figure 8 It is a schematic diagram of division of the back area of ​​the RC-IGBT device 003 according to the second embodiment of the present invention, Figure 9 It is a schematic diagram of the doping distribution of each region on the back of the device 003. Compared with the device 002 of the first embodiment of the present invention, the device 003 also has the following characteristics: there is more than one type A region 21 on the back of the device 003, and the position of the type A region 21 is not limited to the middle of the back of the device 003. The region division feature of the device 003 is suitable for large-area RC-IGBT chips, which is beneficial to improving the current uniformity inside the large-area RC-IGBT chip.

Embodiment 3

[0052] Figure 10 It is a schematic diagram of division of the back area of ​​the RC-IGBT device 004 according to the third embodiment of the present invention, Figure 11 It is a schematic diagram of the doping distribution of each region on the back of the device 004. Compared with the RC-IGBT devices 002 and 003 of the present invention, the device 004 also has the following characteristics: the projected area corresponding to the terminal withstand voltage area on the front of the device 004 on the back of the device 004 is E area (25), then the E area (25 ) within n + The ratio of the cathode area is the highest, that is, δ(A)+ Cathode region 207 is completely covered without p+ collector region 206 . Since there is no MOS channel in the terminal withstand voltage region of the RC-IGBT, this region cannot be used as a conduction current. By increasing δ(E), p in the back region corresponding to the terminal withstand voltage region + The collector region 206 is reduced...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

A reverse conduction type insulated gate bipolar transistor, the invention relates to power semiconductor devices, aiming at the problems existing in RC-IGBT devices in the prior art, the invention provides a design scheme: by optimizing the backside n of the RC-IGBT device + The distribution of the cathode region can solve the problems existing in the prior art. Compared with the traditional RC-IGBT device, the RC-IGBT device of the present invention can maintain a lower positive direction of the device through the special design of the back structure. On the basis of suppressing the turn-on voltage rebound problem of the device without increasing the reverse conduction loss and the process cost, it is beneficial to improve the reliability of the RC-IGBT in practical applications.

Description

technical field [0001] The invention relates to a power semiconductor device, especially the structural design of a reverse conduction insulated gate bipolar transistor (RC-IGBT), that is, a reverse conduction insulated gate bipolar transistor. Background technique [0002] Insulated gate bipolar transistors (IGBTs) are key semiconductor components in electronic systems and are widely used in various medium and high voltage power control systems, such as motor drives and power conversion. An IGBT device contains three electrodes: a collector, an emitter, and a gate that controls the switching of the device. Generally, when the gate is turned off, the traditional IGBT is equivalent to a PNP transistor with an open base, so it does not have the capability of reverse current flow. As a result, the traditional IGBT can only be used as a unidirectional conduction device, that is, the current can only flow from collector to emitter. However, most power circuit systems have the r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/739H01L29/06H01L21/331
Inventor 单建安冯浩袁嵩
Owner 安建科技(深圳)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products