A Reverse Conduction Insulated Gate Bipolar Transistor
A bipolar transistor, insulated gate technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problem of reducing device breakdown voltage, extending the current path length of electrons in the n-type field stop layer 105, and exacerbating the problem. Problems such as uneven current distribution inside the device to achieve the effect of improving reliability
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Embodiment 1
[0044] Device 002 is an RC-IGBT device according to the first embodiment of the present invention. Similar to the RC-IGBT device 001 in the prior art, the device 002 of the present invention is a trench-gate device, that is, its front side has a series of strip-shaped trenches arranged in parallel. Figure 4 It is a schematic diagram of the area division on the back of the device 002. With reference to the arrangement direction of the grooves on the front of the device, the back of the device 002 is divided into four types of rectangular areas: A, B, C, and D. Among them, area A 21 is located in the middle of the back of the device 002, The direction of the connection line between the center of B area 22 and the center of A area 21 is perpendicular to the arrangement direction of the trenches on the front of the device; the direction of the connection line between the center of C area 23 and the center of A area 21 is at an angle of 45 degrees to the arrangement direction of th...
Embodiment 2
[0050] Figure 8 It is a schematic diagram of division of the back area of the RC-IGBT device 003 according to the second embodiment of the present invention, Figure 9 It is a schematic diagram of the doping distribution of each region on the back of the device 003. Compared with the device 002 of the first embodiment of the present invention, the device 003 also has the following characteristics: there is more than one type A region 21 on the back of the device 003, and the position of the type A region 21 is not limited to the middle of the back of the device 003. The region division feature of the device 003 is suitable for large-area RC-IGBT chips, which is beneficial to improving the current uniformity inside the large-area RC-IGBT chip.
Embodiment 3
[0052] Figure 10 It is a schematic diagram of division of the back area of the RC-IGBT device 004 according to the third embodiment of the present invention, Figure 11 It is a schematic diagram of the doping distribution of each region on the back of the device 004. Compared with the RC-IGBT devices 002 and 003 of the present invention, the device 004 also has the following characteristics: the projected area corresponding to the terminal withstand voltage area on the front of the device 004 on the back of the device 004 is E area (25), then the E area (25 ) within n + The ratio of the cathode area is the highest, that is, δ(A)+ Cathode region 207 is completely covered without p+ collector region 206 . Since there is no MOS channel in the terminal withstand voltage region of the RC-IGBT, this region cannot be used as a conduction current. By increasing δ(E), p in the back region corresponding to the terminal withstand voltage region + The collector region 206 is reduced...
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