Method utilizing ultraviolet oxidation in implementing and regulating graphene film patterning

Abstract

Provided in the invention is a method for utilizing ultraviolet oxidation in implementing and regulating graphene film patterning, comprising: a step 1: utilizing a xenon lamp excimer ultraviolet oxidation method and a hard mask in implementing graphene film microstructure graphic patterning; a step 2: by applying a nonuniform magnetic field in the perpendicular direction to the surface of a graphene film, controlling oxygen excitons to move in the direction of the magnetic field towards the graphene film, thus enhancing the directionality of etching the graphene film in the perpendicular direction, and increasing the quality of graphene film microstructure patterning; and a step 3: by adjusting the strength and direction of the magnetic field (such as in the horizontal direction), controlling the directionality of the movement of the oxygen excitons, and regulating the shape being etched on the graphene film graphic structure, thus achieving the goal of regulating graphene film patterning. The method of the invention implements and regulates a micrometer graphic structure array, is suitable for large-area graphene film patterning, free of photoresist contamination, and inexpensive, and provides a patterned graphene film of high quality.

Description

technical field [0001] The invention relates to the technical field of graphene film preparation, in particular to a method for realizing and regulating graphene film patterning by ultraviolet light oxidation. Background technique [0002] Graphene film has excellent carrier mobility, broadband optical transmittance, thermal conductivity and flexibility. As a new material, it has important application prospects in the fields of photons and optoelectronics such as flexible display devices, detector devices, and solar cells. From the birth of single-layer graphene electronic components to the gradual industrialization of large-area graphene films, the patterning of graphene films, that is, the preparation of units and arrays of certain geometric structures or functional structures, is one of the key links. It is the only way for basic research and industrial application of large-scale integrated devices such as photonics and optoelectronics. [0003] At present, the graphene ...

AI Technical Summary

Problems solved by technology

However, due to the enhanced diffusion ability of oxygen excitons in the process of high-temperature ultraviolet light oxidation, the patterned graphene structure of graphene film is highly distorted, and the graphene surface near the edge is seriously damaged.

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