Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Alkali-free silicate glass and preparation method and application thereof

A technology of silicate glass and alkali silicate, which is applied in glass manufacturing equipment, glass production, glass molding, etc., and can solve the problems of reduced mechanical strength and easy deformation of glass

Active Publication Date: 2017-11-24
ZHENGZHOU UNIV
View PDF9 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the sharp reduction in thickness, the thinned glass has reduced mechanical strength and is more easily deformed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Alkali-free silicate glass and preparation method and application thereof
  • Alkali-free silicate glass and preparation method and application thereof
  • Alkali-free silicate glass and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-8

[0049] Weigh each component according to the glass composition shown in Table 1, mix well, pour 1Kg of the mixture into a platinum crucible, then heat in a resistance furnace at 1620°C for 7 hours, and stir with a platinum rod to remove air bubbles. Pour the molten glass into a stainless steel cast iron mold to form a specified block glass product, then anneal the glass product in an annealing furnace for 1 hour, turn off the power and cool down to 25°C with the furnace. The glass product is cut, ground, polished, cleaned with deionized water and dried to obtain a finished glass product. Various properties of each glass product were measured respectively, and the results are shown in Table 1.

[0050] Table 1

[0051]

[0052]

Embodiment 9-13

[0054] Weigh each component according to the glass composition shown in Table 2, mix well, pour 1Kg of the mixture into a platinum crucible, then heat in a resistance furnace at 1620°C for 7 hours, and stir with a platinum rod to remove air bubbles. Pour the molten glass into a stainless steel cast iron mold to form a specified block glass product, then anneal the glass product in an annealing furnace for 1 hour, turn off the power and cool down to 25°C with the furnace. The glass product is cut, ground, polished, cleaned with deionized water and dried to obtain a finished glass product. Various properties of each glass product were measured respectively, and the results are shown in Table 2.

[0055] Table 2

[0056]

[0057]

[0058] From the data of each embodiment in the table 1-2 as can be known, the method of the present invention utilizes the SiO that contains specific content 2 、Al 2 o 3 , B 2 o 3 , MgO, CaO, SrO, BaO, TiO 2 、 Ta 2 o 5 and Tl 2 o 3 The...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Elastic modulusaaaaaaaaaa
Densityaaaaaaaaaa
Thermal expansion coefficientaaaaaaaaaa
Login to View More

Abstract

The invention relates to the field of glass and particularly relates to alkali-free silicate glass and a preparation method and application thereof. The alkali-free silicate glass comprises, by mole, 65-75 mol% of SiO2, 11-17 mol% of Al2O3, Ga2O3 and GeO2, 0-8 mol% of B2O3, 0-15 mol% of MgO, 2-10 mol% of CaO, 0.5-14 mol% of SrO and BaO, 0-10 mol% of TiO2, 0.01-2 mol% of Ta2O5 and 0.01-0.5 mol% of Tl2O3. The alkali-free silicate glass has high thermal stability and dimensional stability, a high strain point, a high specific modulus, a low melting temperature, a low liquidus temperature and low density and is suitable for large-scale industrial production.

Description

technical field [0001] The invention relates to the field of glass, in particular to an alkali-free silicate glass and its preparation method and application. Background technique [0002] With the rapid development of the optoelectronic industry, the demand for various display devices is increasing, such as active matrix liquid crystal display (AMLCD), organic light emitting diode (OLED) and active matrix liquid crystal display (LTPS TFT- LCD) devices, these display devices are based on the use of thin-film semiconductor materials to produce thin-film transistor (TFT) technology. The mainstream silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, among which amorphous silicon (a-Si) TFT is the current mainstream TFT-LCD With the applied technology, its production process can be completed at a temperature of 300-450°C. For display products with a pixel density of no more than 300ppi, am...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C3/091C03C3/118C03C3/112C03C3/11C03C3/087C03C3/085C03C1/00C03B19/02C03B25/00
CPCC03B19/02C03B25/00C03C1/004C03C3/085C03C3/087C03C3/091C03C3/11C03C3/112C03C3/118Y02P40/57
Inventor 何豪梁二军
Owner ZHENGZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com