Multilayer thin film negative electrode for lithium battery, preparation method and application
A multi-layer film and negative electrode technology, applied in electrode manufacturing, battery electrodes, secondary batteries, etc., can solve the problems of limited lithium ion diffusion coefficient, poor rate discharge performance, and large volume change of pure tin, and achieve optimized specific capacity. and cycle performance, the effect of good rate performance
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Embodiment 1
[0030] Multilayer thin film negative electrode, its preparation steps are as follows:
[0031] 1) With the copper foil current collector as the substrate, a carbon film is plated on the surface of the substrate using a vacuum coating process. The process parameters are: high vacuum degree (less than 10 -3 Pa), a carbon rod with a specification of Φ5mm×100mm, a current of 40A, and thermal evaporation for 60s to form a carbon film with a thickness of about 50nm;
[0032] 2) Coating tin film on the carbon film by sputtering coating process, the process parameters are: argon atmosphere, vacuum degree 7Pa, tin target material, voltage 900V, ion flow 5mA, sputtering for 30min, forming a tin film with a thickness of about 150nm , that is. See the microstructure figure 1 .
[0033] Button-type half-cell, using the above-mentioned multi-layer film negative electrode, pure lithium sheet as the positive electrode, lithium hexafluorophosphate as the electrolyte solute, EC, EMC, DEC wit...
Embodiment 2
[0035] Multilayer thin film negative electrode, its preparation steps are as follows:
[0036] 1) Copper foil current collector is used as the substrate, and tin film is plated on the surface of the substrate by sputtering coating process. The process parameters are: argon atmosphere, vacuum degree 7Pa, tin target, voltage 900V, ion current 5mA, sputtering 30min, Form a tin film with a thickness of about 150nm;
[0037] 2) A vacuum coating process is used to plate a carbon film on the tin film, and the process parameters are: high vacuum degree (less than 10 - 3 Pa), a carbon rod with a specification of Φ5mm×100mm, a current of 40A, and thermal evaporation for 60s to form a carbon film with a thickness of about 50nm.
[0038] The composition and structure of the button half-cell are the same as in Example 1.
Embodiment 3
[0040] Multilayer thin film negative electrode, its preparation steps are as follows:
[0041] 1) With the copper foil current collector as the substrate, a carbon film is plated on the surface of the substrate using a vacuum coating process. The process parameters are: high vacuum degree (less than 10 -3 Pa), a carbon rod with a specification of Φ5mm×100mm, a current of 40A, and thermal evaporation for 60s to form a carbon film with a thickness of about 50nm;
[0042] 2) Coating tin film on the carbon film by sputtering coating process, the process parameters are: argon atmosphere, vacuum degree 7Pa, tin target, voltage 900V, ion flow 5mA, sputtering 15min, forming a tin film with a thickness of about 100nm ;
[0043] 3) Repeat step 1) to plate a carbon film with a thickness of about 50 nm on the tin film.
[0044] The composition and structure of the button half-cell are the same as in Example 1.
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