Acid- and radical-generating agent and method for generating acid and radical

Abstract

The present invention addresses the problem of providing: an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of about 300 to 450 nm, can exhibit both high acid-generating ability and high radical-generating ability, and has heat resistance; and a method for producing an acid and a radical. The present invention relates to: a compound represented by general formula (A); an acid- and radical-generating agent comprising the compound; and a method for producing an acid and a radical. (In the formula, n R1's independently represent an alkyl group which may have a specific functional group in the chain and may be substituted by a halogen atom, an alkoxy group which may be substituted by a halogen atom, an aryl or aryloxy group which may be substituted by a halogen atom, an alkyl group or a haloalkyl group, or an arylalkyl or arylalkyloxy group which may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n R2's and n R3's independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R4 to R7 independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom or a carbonyl group; n Z's independently represent a sulfonyl group or an alkoxyphosphoryl group; and n represents 1 or 2.)

Description

technical field [0001] The present invention relates to compounds useful as acid generators and radical generators used in the field of resists, etc., and more specifically, to compounds capable of generating acids and radicals when irradiated with active energy rays around a wavelength of 300 to 450 nm. Compounds of the nature, acids and free radical generators containing these compounds, and acid and free radical generating methods. Background technique [0002] Conventionally, as a resist material used in a photolithography process, for example, a resin composition containing a resin and a photoacid generator is known. The resin is tert-butyl ester of carboxylic acid or tert-butyl ester of phenol. Ethers, silyl ethers, etc. are reacted with carboxylic acid derivatives or phenol derivatives by the action of acid to form alkali-soluble resins. In such a resin composition, for example, when irradiated with active energy rays such as ultraviolet rays, the photoacid generator...

AI Technical Summary

Problems solved by technology

In addition, in order to increase the sensitivity to active energy rays in the long-wavelength region, for example, an aromatic ring such as an anthracene ring or a pyrene ring as a substituent is bonded to an aryl group such as an arylsulfonium salt to extend the conjugated system. Ionic acid generators have the following problems: Generally, their solubility becomes poor, they are easily precipitated as solids in resin compositions, and their stability in organic solvents is poor. Therefore, they cannot be stored for several weeks and are resistant to Etch properties are prone to changes (e.g., dimensional changes, sensitivity changes, shape changes, etc.), etc.

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