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Photosensitive conductive film, conductive pattern formation method using same, and conductive pattern substrate

A conductive pattern and conductive film technology, which is applied in the formation of conductive patterns and the field of conductive pattern substrates, can solve the problems of reduced yield, long process, and high cost burden, and achieve low contact resistance, sufficient adhesion, and good electrical connection Effect

Active Publication Date: 2016-05-18
RESONAC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] ITO films, tin oxide films, etc. are usually formed by sputtering, but the properties of transparent conductive films are likely to change depending on the sputtering method, sputtering power, air pressure, substrate temperature, and the type of atmospheric gas.
The difference in the film quality of the transparent conductive film caused by the change of the sputtering condition becomes the cause of the variation in the etching rate when the transparent conductive film is wet-etched, and the yield of the product is likely to decrease due to poor layout.
In addition, the above-mentioned method of forming a conductive pattern includes a sputtering process, a resist forming process, and an etching process, and the process is long, which also poses a large burden in terms of cost.

Method used

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  • Photosensitive conductive film, conductive pattern formation method using same, and conductive pattern substrate
  • Photosensitive conductive film, conductive pattern formation method using same, and conductive pattern substrate
  • Photosensitive conductive film, conductive pattern formation method using same, and conductive pattern substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0181]

[0182] On a polyethylene terephthalate film (PET film, manufactured by Teijin Co., Ltd., trade name: G2-16) with a thickness of 16 μm prepared as the first film (coating film) at 20 g / m 2 The above-mentioned conductive fiber dispersion liquid 1 was uniformly applied, dried by a hot air convection dryer at 100°C for 10 minutes, and pressed at room temperature (25°C) with a linear pressure of 1 MPa, thereby forming a layer containing Conductive layer of conductive fibers. In addition, as a result of measurement with a scanning electron micrograph, the film thickness after drying of the conductive layer was about 0.1 μm.

[0183] Then, on a polyethylene terephthalate film (PET film, manufactured by Teijin Co., Ltd., trade name: G2-50) with a thickness of 50 μm prepared separately as the second film (support film), it was evenly coated The solution (X) of the said photosensitive resin composition was dried for 10 minutes with the hot-air convection dryer of 100 degreeC...

Embodiment 2～10、 comparative example 1、2

[0210] A photosensitive resin composition was produced in the same manner as in Example 1 except that the solution (X) of the photosensitive resin composition obtained by compounding the materials shown in Table 2 was used in the compounding amounts (unit: parts by mass) shown in Table 2. For the conductive film, the surface resistivity, light transmittance, and electrical connectivity with the connection terminals on the surface of the substrate were evaluated for the conductive pattern. The results are shown in Table 2.

[0211] For each material in Table 2, the following materials were used.

[0212] (B) Ingredients

[0213] PET-30: Pentaerythritol triacrylate (manufactured by Nippon Kayaku Co., Ltd.)

[0214] TMPTA: Trimethylolpropane triacrylate (manufactured by Nippon Kayaku Co., Ltd.)

[0215] (C) Ingredients

[0216] OXE-01: 1,2-octanedione, 1-[4-(phenylthio)phenyl-2-(O-benzoyl oxime)] (manufactured by BASF Corporation)

[0217] (D) Ingredients

[0218] Silica fi...

Embodiment 11～13

[0230] The solution (X) of the photosensitive resin composition obtained by compounding the materials shown in Table 3 according to the compounding amount (unit: mass part) shown in Table 3 was used, and a photosensitive resin composition was produced in the same manner as in Example 1. For the conductive film, the surface resistivity, light transmittance, and electrical connectivity with the connection terminals on the surface of the substrate were evaluated for the conductive pattern. The results are shown in Table 3.

[0231] For each material in Table 3, the following materials were used.

[0232] (A) Ingredients

[0233] Acrylic polymer A: an acrylic resin having a copolymerization ratio of methacrylic acid / methyl methacrylate / ethyl acrylate / styrene=20 / 50 / 20 / 10, and a weight average molecular weight of 80,000

[0234] Acrylic polymer B: an acrylic resin having a copolymerization ratio of methacrylic acid / methyl methacrylate / ethyl acrylate / 2-hydroxyethyl methacrylate=20 / ...

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Abstract

This conductive pattern formation method comprises the following: a step in which prepared is a photosensitive conductive film having, in this order, a conductive layer containing conductive fibers, a photosensitive resin layer containing a photosensitive resin and an inorganic filler, and a support film, and the conductive layer and the photosensitive resin layer are laminated on the substrate from the conductive layer side so as to be tightly adhered thereto; and a step in which a conductive pattern is formed by exposing and developing the photosensitive resin layer and the conductive layer which are on the substrate.

Description

technical field [0001] The present invention relates to a photosensitive conductive film, a method for forming a conductive pattern using the photosensitive conductive film, and a conductive pattern substrate, and particularly relates to devices such as flat panel displays, touch panels (touch panels), solar cells, and lighting as liquid crystal display elements and the like The formation method of the conductive pattern used for the electrode wiring and the conductive pattern substrate. Background technique [0002] Liquid crystal display elements, touch panels, etc. are used in large electronic equipment such as personal computers and televisions, small electronic equipment such as car navigation systems, mobile phones, and electronic dictionaries, and display devices such as OA and FA equipment. In these liquid crystal display elements and touch panels, a transparent conductive film is used for wiring, pixel electrodes, or a part of terminals that are required to be trans...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B13/00B32B27/12B32B27/16B32B27/18H01B5/14
CPCB32B3/08B32B7/06B32B7/12B32B9/045B32B27/08B32B27/12B32B27/20B32B27/32B32B27/36B32B2255/10B32B2255/26B32B2264/10B32B2264/102B32B2264/104B32B2307/202B32B2307/306B32B2307/40B32B2307/412B32B2307/748B32B2457/00B32B2457/202B32B2457/208G03F7/0047G03F7/033G03F7/343B32B37/16B32B2457/20G03F7/027G03F7/032G03F7/20H01B5/14B32B5/02B32B27/30B32B2262/103B32B2264/107G03F7/16G03F7/32
Inventor 海老原雅彦太田绘美子村上泰治山崎宏田仲裕之
Owner RESONAC CORP
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