Sputtering target capable of enhancing wear resistance and corrosion resistance of coated glass and manufacturing method

A technology of coated glass and sputtering target material, which is applied in the direction of chemical instruments and methods, sputtering coating, glass/slag layered products, etc., can solve the problems of lack of reference and enlightenment, and achieve uniform composition, stable arc light, and good Effect of Sputtering Properties

Inactive Publication Date: 2015-11-18
GEMCH MATERIAL TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, very little reference and inspiration has been provided in this regard

Method used

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  • Sputtering target capable of enhancing wear resistance and corrosion resistance of coated glass and manufacturing method
  • Sputtering target capable of enhancing wear resistance and corrosion resistance of coated glass and manufacturing method
  • Sputtering target capable of enhancing wear resistance and corrosion resistance of coated glass and manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Embodiment 1: Prepare rotating target by cold spraying, as attached figure 1 As shown, the end face of the stainless steel pipe with an inner diameter (50-130) mm and an outer diameter (60-140) mm is processed into a spiral groove, a straight groove, a thread shape or a welded flange shape according to the drawing, and the middle part of the steel pipe is sprayed. Sand is used for surface roughening treatment, followed by an electric arc for a bonding layer, and then loaded into cold spray equipment; use granulated and agglomerated wear-resistant and weather-resistant powder, and the powder particle size is (1-80) um. The powder is fed into the cold spray gun by the powder feeder and sprayed on the surface of the stainless steel pipe. The spraying of the target can be completed by two methods: spray gun movement or workpiece movement. It can be made into a dog-bone rotating target with adjustable length and thickness at both ends. After the spraying is finished, the su...

Embodiment 2

[0032] Embodiment 2: plasma spraying prepares rotating target material, as attached figure 2 As shown, the end face of the stainless steel pipe with an inner diameter (50-130) mm and an outer diameter (60-140) mm is processed into a spiral groove, a straight groove, a thread shape or a welded flange shape according to the drawing, and the middle part of the steel pipe is sandblasted. The surface is roughened, and then a layer of bonding layer is arced, and then loaded into the auxiliary plasma spraying equipment, using granulated and agglomerated wear-resistant and weather-resistant powder, the powder particle size is (1-80) um. The powder is fed into the plasma spray gun through the powder feeder to spray on the surface of the stainless steel pipe. The spraying of the target can be completed by two methods: spray gun movement or workpiece movement. It can be made into a dog-bone rotating target with adjustable length and thickness at both ends. After the spraying is finishe...

Embodiment 3

[0034] Embodiment 3: Powder metallurgy method prepares planar target material, as attached image 3 As shown, the powder composition is detected by ICP, and the purity is above 99.5%; the particle size and particle size distribution of the powder are detected by a Coulter particle size analyzer. After the test is passed, the powder is weighed, sieved, weighed and mixed with powder, and granulated. Then put the mixed powder into the mold. Put them together into a vacuum hot-press furnace, vacuumize, heat, and press at a high temperature under a pressure of (10-100) MPa to form a block. Hot pressing temperature (1400-1600) ℃, holding time (20-30) h. After the vacuum hot pressing is completed, lower the temperature to below 100°C, open the hot pressing furnace, take out the mold and target block, lower it to below 50°C, take out the target block from the mold, cut, grind, clean, and dry to make the required target size. If the size of the prepared target block does not meet th...

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Abstract

The invention discloses a sputtering target capable of enhancing wear resistance and corrosion resistance of coated glass and a preparation method of the sputtering target . The sputtering target mainly comprises a zirconium based material; the shape and specification of the target are not limited, and a rotating target and a plane target can be manufactured; the rotating target is prepared through the equivalent cold spraying and plasma spraying technology; the plane target is prepared through the following steps: target blocks are prepared through the powder metallurgy technology, and then the target blocks are spliced and bound to form a large-size target; the structure of the target is compact, the components of the target are uniform, and the electrical conductivity of the target is excellent; the density is (5.3-5.9) g/cm3, and the relative density is greater than 90%. The target has excellent sputtering performance, stable arc light, and a sputtering coating rate of (0.5-1.0) nm*m/min. A plated zirconium based film is used as a protective film and has excellent binding force with adjacent films and excellent abrasive resistance and weather fastness; after film coating, glass requires no film protection, can be stored for a long time, facilitates deep processing in different places, effectively prevents coated glass from scratching and scrapping during the follow-up deep-processing process, and requires no film removal of a side before lamination.

Description

technical field [0001] The invention relates to the selection of IPC classification H01B dielectric materials or the C23C coating technology for metal materials, which belongs to the coating glass manufacturing technology, especially the sputtering target material and manufacturing method for enhancing the wear resistance and corrosion resistance of the coating glass. Background technique [0002] In the past two decades, target sputtering coating technology has been widely used in the fields of low-emissivity glass, anti-reflection glass and transparent conductive glass in China, which has promoted the rapid development of multifunctional glass and energy-saving glass industries. [0003] Low-emissivity glass is also called Low-E glass, and Low-E is the abbreviation of English Low-Emissivity. At present, the industry generally uses SnO 2 Or SiNx film is used as the top protective layer of Low-E glass. After the glass is coated, several reprocessing processes in cutting, ed...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B17/06C23C14/34
CPCB32B17/061B32B17/068C23C14/34
Inventor 温艳玲黄小军诸斌庄志杰
Owner GEMCH MATERIAL TECH SUZHOU
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