Capacitive strain sensor and preparation method therefor
A technology of strain sensor and capacitance, which is applied in the direction of electric/magnetic solid deformation measurement and electromagnetic measurement device, etc., can solve the problems of unfavorable control of medium material quality, low strain and temperature, large dielectric loss, etc., and achieve accurate line width, The effect of high strain sensitivity and small temperature coefficient
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Embodiment 1
[0032] A preparation method of a capacitive strain sensor based on alumina ceramics, comprising the following steps
[0033] Step 1. Surface treatment of alumina substrate: use 1.25×1.25cm 99.9% alumina substrate as the substrate, successively use acetone, ethanol and deionized water to clean the substrate, and dry it with clean nitrogen after cleaning. ;
[0034] Step 2, depositing the first Ba on the alumina substrate 0.5 Sr 0.5 TiO 3 Dielectric film: put the alumina substrate cleaned in step 1 in a vacuum of 8.0×10 -4 Pa vacuum (back vacuum) environment, in Ba 0.5 Sr 0.5 TiO 3 Ceramic as the target material, argon gas with a purity of not less than 99.9% and 99.5% oxygen with a flow ratio of 4:1 as the reaction medium, at a temperature of 750°C, a power of 200W, and an air pressure of 2Pa, in alumina Deposit Ba with a thickness of 1 μm on the ceramic substrate 0.5 Sr 0.5 TiO 3 ceramic film;
[0035] Step 3, preparation of patterned PdCr interdigital electrodes: p...
Embodiment 2
[0051] A method for preparing a capacitive strain sensor based on an alloy, comprising the following steps:
[0052] Step 1. Surface treatment of the substrate: first, polish the surface of the alloy substrate, and the polished surface is a mirror surface; then ultrasonically clean it in acetone, ethanol and deionized water for 10 minutes respectively, and dry it with clean nitrogen after cleaning;
[0053] Step 2. Prepare a NiCrAlY transition layer on the surface of the substrate cleaned in step 1: In order to improve the service life of the strain sensor in harsh environments and make the film have good adhesion, prepare a layer of transition layer NiCrAlY on the surface of the alloy substrate; The clean alloy substrate is placed in a vacuum of 8.0×10 -4 Pa vacuum (back vacuum) environment, with Ni 67 Cr 22 al 10 Y alloy is used as the target material, and argon gas with a purity of 99.999% (volume percentage) is introduced as the sputtering medium. Under the conditions o...
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