High-sided transverse double diffused field effect transistor
A field effect transistor, lateral double diffusion technology, used in semiconductor devices, electrical components, circuits, etc.
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[0014] In order to make the technical problems, technical solutions and improvement effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0015] The high-side lateral double-diffused field-effect transistor structure of the present invention, such as figure 2 As shown, it includes: P-type substrate 201, N- epitaxial layer 202, P+ buried layer 203, P+ pair isolation 204, field oxygen 205, P-top layer 206, P-body regions 207 and 213, P-body region Contact P+ 208 and 214 , N+ source electrode 209 , gate oxide layer 210 , polysilicon gate electrode 211 , and N+ drain electrode 212 .
[0016] The upper surface of the P-type substrate 201 is an N- epitaxial layer 202 . One side of the N- epitaxial layer 202 is provided with a P+ buried layer 203 and a P+ pair isolation 204 for isolating different types of devices. The other side of the N− epitaxial layer 202 is provid...
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