SiGe-heterojunction bipolar transistor (HBT) and preparation method thereof
A technology of transistors and conductors, applied in the field of SiGe heterojunction bipolar transistors and its preparation, can solve the problems of lower characteristic frequency, deterioration of breakdown voltage, increase of doping concentration in collector area, etc., to improve fT and reduce ionization The probability of collision and the effect of increasing the characteristic frequency
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Embodiment 1
[0059] Control attached Figure 2a-2d A further explanation and illustration is made on the preparation method of a SiGe-HBT transistor provided by the present invention.
[0060] First, if Figure 2a The structures shown were prepared using conventional techniques known to those skilled in the art, and the materials described were conventional materials well known to those skilled in the art. For example, a general SiGe heterojunction double transistor is fabricated on a semiconductor substrate (not shown in the figure), and the substrate material is selected from one of Si, Ge, and GeSi, but not limited to these materials. The substrate can be an N-type or P-type substrate, depending on the type of device being fabricated.
[0061] exist Figure 2a The structure in includes a sub-collector region 11 formed on a semiconductor substrate (not shown in the figure), and the sub-collector region 11 is formed by a conventional ion implantation or epitaxial growth process, and th...
Embodiment 2
[0076] The present invention also provides a SiGe-HBT transistor structure, such as Figure 2d shown, including:
[0077] The sub-collector region 11 isolated by the deep trench isolation 12, and the collector region 14 formed on the sub-collector region 11 and isolated by the shallow trench isolation region 13, and the collector region is formed on the sub-collector region Electrode contacts 20 .
[0078] The base region 16 is formed on the collector region 14 and the shallow trench isolation region 13, including an intrinsic SiGe layer 160, heavily doped P + The polysilicon outer base layer 162 and the intrinsic SiGe layer 160 and heavily doped P + The base region P-SiGe:C layer 161 between the polysilicon outer base region layers 162, the contact interface of the collector region 14 and the base region 16 is formed with a collector-base junction space charge region 15, and the P + A base contact 21 is formed on the polysilicon outer base layer 162 .
[0079] emitter reg...
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