Preparation method for ultrathin flexible crystalline silicon battery

Abstract

The invention discloses a preparation method for an ultrathin flexible crystalline silicon battery. In the method, a CFZ silicon chip, an MCZ silicon chip or an FZ silicon chip is introduced as a substrate, a texturing sheet with a thickness less than 100 [mu]m is prepared through texturing thinning, a PN junction is prepared by use of a routine high temperature diffusing method, after cleaning, Al2O3 is plated through a microwave type flat PECVD to be taken as a back-surface passivating film, after the front surface and the back surface of the silicon chip is plated with a SiNx reflection reduction film and a protective film, an electrode contact window is opened by use of a laser film opening method, a novel electrode structure pattern is introduced, through process improvement, an aluminum back conducting layer whose aluminum slurry thickness is very small, a front electrode and a back electrode are prepared by use of a screen printing method, the ultrathin high-efficiency crystalline silicon battery with excellent electrical performance is formed through sintering, and a miniaturized battery which facilitates assembly packaging and has high reliability is formed through cutting by use of a laser cutting method. According to the ultrathin flexible crystalline silicon battery prepared by use of the preparation method, a majority of process steps can be finished on a routine crystalline silicon battery production line, the power-mass ratio is high, the battery is suitable for a low-altitude aircraft, the preparation cost is quite low, and the application prospect is wide.

Description

technical field [0001] The invention belongs to the field of preparation of crystalline silicon batteries, and in particular relates to a preparation method of ultra-thin and efficient flexible crystalline silicon batteries. Background technique [0002] Improving the application range and depth of solar cells has always been the unremitting pursuit of people. At present, crystalline silicon solar cells have been widely used in ground space and have been recognized by people. High specific flexible solar cells have always been the most basic requirement for the normal operation of high-altitude aircraft. [0003] The aerospace field needs flexible solar cell modules with strong stability, high resistance to radiation attenuation, power-to-mass ratio, and high cost performance. The earliest solar cell used in the international aerospace field was N-type crystalline silicon cells, but after high-energy radiation in space, the efficiency attenuated and the stability was lower ...

AI Technical Summary

Problems solved by technology

The earliest solar cell used in the international aerospace field was N-type crystalline silicon cells, but after high-energy radiation in space, the efficiency attenuated and the stability was lower than that of P-type crystalline silicon cells. P-type crystalline silicon cells became the first choice for space applications. Later, arsenic A breakthrough in the preparation of gallium chloride, and replaced the P-type battery

Thin-film solar cell components such as amorphous silicon and copper indium gallium selenide have low attenuation resistance, and the efficiency attenuation is relatively large after space irradiation tests; the preparation process of gallium arsenide is extremely difficult, the price of cell components is too high, and there are few international research and development units

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