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Neutral salt for use in polishing liquid, electronic material polishing liquid, polishing method, and method of manufacturing electronic materials

A technology of electronic materials and manufacturing methods, applied in chemical instruments and methods, polishing compositions containing abrasives, manufacturing tools, etc., can solve problems such as hindering high-capacity disks and poor adhesion, and achieve continuous grinding speed Excellent, adhesion-reducing, and surface-defective effects

Inactive Publication Date: 2014-03-05
SANYO CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Scratches generated on the substrate will cause poor adhesion between the magnetic film and the substrate in the subsequent dielectric process, for example, and will become a factor that hinders the high capacity of the magnetic disk

Method used

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  • Neutral salt for use in polishing liquid, electronic material polishing liquid, polishing method, and method of manufacturing electronic materials
  • Neutral salt for use in polishing liquid, electronic material polishing liquid, polishing method, and method of manufacturing electronic materials
  • Neutral salt for use in polishing liquid, electronic material polishing liquid, polishing method, and method of manufacturing electronic materials

Examples

Experimental program
Comparison scheme
Effect test

manufacture example 1

[0212] Production example 1 (manufacture of polyacrylic acid DBU salt)

[0213] 300 parts of isopropanol and 100 parts of ultrapure water were put into the reaction container whose temperature adjustment and stirring were possible, and after replacing the inside of the reaction container with nitrogen gas, it heated up to 75 degreeC. While stirring at 30 rpm, 407 parts of a 75% aqueous solution of acrylic acid and 95 parts of a 15% isopropanol solution of dimethyl 2,2'-azobisisobutyrate were simultaneously added dropwise over 3.5 hours.

[0214] After completion of the dropwise addition, after stirring at 75° C. for 5 hours, ultrapure water was intermittently added to prevent solidification in the system, and the mixture of water and isopropanol was distilled off until isopropanol could not be detected. The resulting polyacrylic acid aqueous solution was neutralized to pH 7.0 with 450 parts of DBU, and the concentration was adjusted with ultrapure water to obtain a 40% aqueous...

manufacture example 2

[0216] Production example 2 (manufacture of naphthalenesulfonic acid formaldehyde condensate DBU salt)

[0217] 21 parts of naphthalenesulfonic acid and 10 parts of ultrapure water were put into a stirred reaction vessel, and 8 parts of 37% formaldehyde were added dropwise over 3 hours while stirring to keep the temperature in the system at 80°C. After the dropwise addition, the temperature was raised to 105°C. After reacting for 25 hours, it was cooled to room temperature (about 25°C), adjusted to 25°C in a water bath while adding DBU slowly, and the pH was adjusted to 6.5 (using about 15 parts of DBU). Ultrapure water was added to adjust the solid content to 40%, thereby obtaining a 40% aqueous solution of DBU salt (AB-2) of a naphthalenesulfonic acid formaldehyde condensate as an anionic surfactant. In addition, Mw of the DBU salt of (AB-2) was 5,000.

manufacture example 3

[0218] Production example 3 (manufacture of polystyrene sulfonate guanidine salt)

[0219]100 parts of dichloroethane was charged into a temperature-adjustable and refluxed stirred reaction vessel, and nitrogen substitution was carried out under stirring. After that, the temperature was raised to 90° C., and dichloroethane was refluxed. Add 120 parts of styrene and 1.7 parts of 2,2'-azobisisobutyronitrile dissolved in 20 parts of dichloroethane in advance into the reaction container dropwise over 6 hours. After further polymerization for 1 hour. After the polymerization, it was cooled to 20° C. under a nitrogen seal, and then 105 parts of anhydrous sulfuric acid was added dropwise over 10 hours while controlling the temperature at 20° C. After the dropwise addition, sulfonation reaction was further performed for 3 hours. After the reaction, the solvent was distilled off to solidify, and then 345 parts of ultrapure water was injected and dissolved to obtain a polystyrenesulfon...

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Abstract

This invention comprises: a specific neutral salt (AB) used in a step for polishing an electronic material intermediary using a polishing pad; an electronic material polishing liquid containing said neutral salt (AB); a polishing method for polishing an electronic material intermediary using said electronic material polishing liquid; and a manufacturing method of an electronic material involving a step for polishing an electronic material intermediary with said polishing method. Here, the neutral salt (AB) is a salt of (A) an acidic compound having at least one acid radical (X) in the molecule, and (B) a nitrogen-containing basic compound having a 10-152 kcal / mol heat of formation change (Q2) in protonation reactions, wherein said neutral salt has a 3-200 kcal / mol heat of formation change (Q1) in acid dissociation reactions of the aforementioned acid radical (X). Thus provided is a material which, compared to conventional polishing liquids, results in fewer substrate defects such as scratches, which further, in a subsequent washing step, facilitates removal of polishing debris, and which further makes it possible to sustain polishing speed in the polishing step.

Description

technical field [0001] The present invention relates to a neutralization salt used in a grinding process, a polishing solution for electronic materials containing the neutralization salt, a grinding method for grinding an electronic material intermediate using the grinding solution for electronic materials, and a grinding method comprising using the grinding method. The electronic material manufacturing method of the electronic material intermediate process. [0002] In more detail, the present invention relates to a neutralization salt, which is used in a grinding process in an electronic material manufacturing process. Compared with the past, the continuity of the grinding speed is good and the surface quality of the electronic material is improved. The present invention also relates to A polishing liquid for electronic materials containing the neutralizing salt, a polishing method for polishing an intermediate electronic material using the polishing liquid for electronic ma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K3/14B24B37/00H01L21/304
CPCB24B37/044H01L21/30625C09G1/02
Inventor 山口俊一郎
Owner SANYO CHEM IND LTD
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