Preparation method for copper zinc tin sulfide thin film material
A thin-film material, copper-zinc-tin-sulfur technology, applied in final product manufacturing, sustainable manufacturing/processing, electrical components, etc., can solve the problems of poor bonding force between metal molybdenum and metal prefabricated layers, affecting the photoelectric conversion efficiency of solar cells, etc. Achieve the effect of reducing carrier recombination centers, reducing production costs, and increasing photoelectric conversion efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0023] (1) Pretreatment of copper tape as flexible substrate and back contact conductive material
[0024] The pretreatment of copper strip is degreasing, electrochemical polishing and activation. Among them, the degreasing liquid adopts 0.1M / L sodium hydroxide solution; the electrochemical polishing liquid adopts a mixture of 30% sulfuric acid, 30% phosphoric acid, 40% deionized water, and 10g / L polyethylene glycol with a molecular weight of 6000, which is used for polishing. The current density is 10mA / cm 2 1. The temperature of the solution is 80° C.; the activation solution adopts a sulfuric acid solution with a mass fraction of 10%.
[0025] (2) Deposit zinc and tin on the pretreated copper strip to form a metal prefabricated layer
[0026] The deposition method is a magnetron sputtering method, and the deposition method is to deposit metallic zinc first and then deposit metallic tin, and the molar ratio of deposited metallic zinc to metallic tin is 0.2.
[0027] (3) P...
Embodiment 2
[0033] (1) Pretreatment of copper tape as flexible substrate and back contact conductive material
[0034] The pretreatment of copper strip is degreasing, electrochemical polishing and activation. Among them, the degreasing liquid adopts 0.1M / L sodium hydroxide solution; the electrochemical polishing liquid adopts a mixture of 30% sulfuric acid, 10% phosphoric acid, 60% deionized water, and 1 g / L polyethylene glycol with a molecular weight of 6000. The current density is 50mA / cm 2 1. The temperature of the solution is 50°C; the activation solution adopts a sulfuric acid solution with a mass fraction of 30%.
[0035] (2) Deposit zinc and tin on the pretreated copper strip to form a metal prefabricated layer
[0036] The deposition method is an evaporation method, and the deposition method is to deposit metallic tin first and then deposit metallic zinc, and the molar ratio of deposited metallic zinc to metallic tin is 3.
[0037] (3) Put the metal prefabricated layer in a sul...
Embodiment 3
[0043] (1) Pretreatment of copper tape as flexible substrate and back contact conductive material
[0044] The pretreatment of copper strip is degreasing, electrochemical polishing and activation. Among them, the degreasing solution adopts 0.1M / L sodium hydroxide solution; the electrochemical polishing solution adopts a mixed solution of 10% sulfuric acid, 10% phosphoric acid, 80% deionized water, and polyethylene glycol 5g / L with a molecular weight of 6000, which is used for polishing. The current density is 100mA / cm 2 1. The temperature of the solution is 20° C.; the activation solution adopts a sulfuric acid solution with a mass fraction of 50%.
[0045] (2) Deposit zinc and tin on the pretreated copper strip to form a metal prefabricated layer
[0046] The deposition method can be a laser pulse deposition method, and the deposition method is alternate deposition of metal zinc and tin, and the molar ratio of deposited metal zinc to metal tin is 5.
[0047] (3) Put the me...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com