Method for construction of high power LED multilayer gradient material cooling channel

A heat dissipation channel and gradient material technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as failing to meet the high-efficiency heat dissipation requirements of high-power LEDs, reduce package thermal resistance and thermal mismatch, and improve Heat dissipation capacity and stability, good economic benefits

Inactive Publication Date: 2010-06-02
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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Problems solved by technology

Since the thermal conductivity of the eutectic alloy of 20% Au-80% Sn is only 53W / m.k, with 1mm 2 The area of ​​the connection layer is calculated, the thermal resistance is as high as 0.5°C / W, and the insulating layer is SiO 2 The thermal conductivity is 1.1W / m.K, the thickness is 0.2 microns, and the thermal resistance is 0.2°C / W. In addition to the thermal resistance of the fast heat conduction plate and the thermal resistance of the interface between layers, the current flip-chip process cannot meet the high-power requirements. Efficient heat dissipation requirements for LEDs

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  • Method for construction of high power LED multilayer gradient material cooling channel
  • Method for construction of high power LED multilayer gradient material cooling channel

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Embodiment Construction

[0018] The invention adopts the Au-Au-AlN-Ti multilayer material with high thermal conductivity and gradient change of thermal expansion coefficient to prepare the heat dissipation channel between the LED and the Cu rapid thermal diffusion plate, which greatly reduces the package thermal resistance and thermal mismatch, and improves the heat dissipation capacity of the device and stability.

[0019] The following is a detailed description of the preparation process of the pure gold bonded flip-chip LED chip:

[0020] First, use ICP (Inductively Coupled Plasma Etching) or IBE (Ion Beam Etching) equipment to dry-etch the GaN-based LED epitaxial wafer to form an L-shape, exposing the N-GaN layer 2 mesa, in which the etching mask layer 3 is photoresist or SiO 2 .

[0021] After the mesa of the N-GaN layer 2 is exposed, a layer of ITO (indium tin oxide) current spreading layer 5 is evaporated on the surface of the P-GaN layer 4; then the P and N electrodes are evaporated by magne...

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Abstract

The invention provides a construction method for a high power LED multilayer gradient material heat dispersion channel, which includes steps: 1) GaN-base LED chip preparation: etching a GaN-base LED epitaxial wafer by dry process to form a L shape and expose N-GaN layer surface; vaporizing a indium tin oxide current expansion layer on surface of the P-GaN, vaporizing P, N electrodes and plating pure gold on the P, N electrode; 2) Cu fast heat diffusion board preparation: preparing a L-shaped Cu board, sputtering a layer of Ti or Cr by magnetic control to be used as a adhesive layer; sputteringa layer of AlN on the Ti layer by magnetic control to be used as a insulated layer; vaporizing a layer of thin gold and plating a layer of thick pure gold; 3) pure gold bonding by thermocompression bonding: upside-down mounting the LED chip on the Cu fast heat diffusion board. By employing Au-Au-AlN-Ti multilayer material with high thermal conductance and gradient changed thermal coefficient of expansion to construct the heat dispersion channel between the LED and the Cu fast heat diffusion board, heat diffusion problem of high power LED is resolved, heat diffusion capability and stability ofdevice is increased.

Description

technical field [0001] The invention relates to a manufacturing process of a high-power LED device, in particular to a multi-layer gradient material and a construction method of a high-power LED cooling channel. Background technique [0002] The early gallium nitride-based white LED package was in the form of front mounting, and the heat sink was connected to the sapphire layer through the connection layer. The heat generated in the active area of ​​the LED is conducted to the heat sink via the n-GaN layer, the sapphire substrate and the connection layer. Since the thermal conductivity of sapphire is only 30W / m.k and the thickness is about 100 microns, it forms a large thermal resistance. The heat dissipation form of the LED package in the formal form can only be applied to low-power LEDs. [0003] In order to solve the heat dissipation problem of high-power LEDs, vertical structure LEDs and flip-chip LED structures have emerged. The vertical structure LED uses laser lift...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/00H01L21/50H01L21/48H01L33/64
Inventor 王敏锐黄宏娟张宝顺杨辉
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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