Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for making GaMnN sparse magnetic semiconductor nano wire

A dilute magnetic semiconductor and nanowire technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as material difficulties, magnetic impurity phase precipitation, and low sample yield

Inactive Publication Date: 2008-02-20
PEKING UNIV
View PDF0 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the low solid solubility of magnetic ions in semiconductors, it is still very difficult to prepare highly doped GaMnN dilute magnetic semiconductor materials with Mn replacing lattice cations by traditional methods. Moreover, it has been reported in the literature that using the above method If the doping concentration of Mn in GaN is greater than 3at.% during preparation, Mn ions will fill in the lattice gap instead of replacing Ga, thus forming Ga x mn y Crystal grains affect the magnetic properties of the material, and there is a problem of magnetic impurity phase precipitation
People such as Deepak (F.L.Deepak, P.U.Vanitha, A.Fovindaraj, C.N.R.Rao, Chem.Phys.Lett.374 (2003) 314) utilize carbon nanotube as template, have prepared GaMnN dilute magnetic semiconductor nanowire, but sample yield is relatively low few

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for making GaMnN sparse magnetic semiconductor nano wire
  • A method for making GaMnN sparse magnetic semiconductor nano wire

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] 1. GaMnN dilute magnetic semiconductor nanowires were prepared in large quantities by oxide ammoniation method.

[0020] A Si sheet coated with a 5nm gold film was used as the collection substrate of the product, and the MnCl 2 4H 2 A small ceramic cup of O powder, a gallium source substrate (a Si sheet with 100 mg of gallium metal placed on it) and three collection substrates were put into a quartz boat with one end open in turn, and the small ceramic cup was about 10 cm away from the gallium source substrate. Then place the quartz boat in the center of the tube furnace with the open end facing the direction of the airflow. After closing the system, turn on the mechanical pump to evacuate to a vacuum, pass in argon gas for cleaning, and raise the system pressure to normal pressure, and repeat this three times. After the experiment started, the required pressure (0.6-0.9 standard atmospheric pressure) was maintained by manually controlling the needle valve, and the he...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The utility model discloses a method for preparing the GaMnN diluted magnetic semiconductor nanowire, comprising the following steps: 1) Mn doping: Mn is in-situ doped on the Ga2O3 nanowire; 2) ammonification: the Ga2O3 nanowire doped with the Mn is aminated in the ammonia atmosphere to obtain the GaMnN diluted magnetic semiconductor nanowire. The utility model has the advantages of simple method, low requirement for the equipment, strong ferromagnetism of the prepared GaMnN nanowire, higher Curie temperature than the ambient temperature, controllable magnetic doping concentration, high purity of the nanowire, high output and controllable linear (the nanowire with diameter varying from tens of nanometer to hundreds of nanometer is prepared through adjusting the growing parameters such as air pressure). The utility model is applied for producing the nanometer spin electronic devices, such as spin field effect transistor (spin-FET), spin light emitting diode (spin-LED) and spin resonance tunneling device (spin-RTD) and has broad application prospect.

Description

technical field [0001] The invention relates to a method for preparing nanowires, in particular to a method for preparing GaMnN dilute magnetic semiconductor nanowires. Background technique [0002] The room temperature ferromagnetism of dilute magnetic semiconductor materials is an important property of whether it can be used in the manufacture of spintronic devices. As a wide bandgap semiconductor material, GaN has excellent optical and electrical properties. In theory, GaN doped with Mn will make It has a ferromagnetic order higher than room temperature, so GaMnN dilute magnetic semiconductor materials are current research hotspots. However, due to the low solid solubility of magnetic ions in semiconductors, it is still very difficult to prepare highly doped GaMnN dilute magnetic semiconductor materials with Mn replacing lattice cations by traditional methods. Moreover, it has been reported in the literature that using the above method If the doping concentration of Mn i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/18
Inventor 俞大鹏宋祎璞王朋伟
Owner PEKING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products