Ion plating modified method for bipolar plate of stainless steel for fuel cell in type of proton exchange membrane
A proton exchange membrane and fuel cell technology, applied in fuel cells, battery electrodes, circuits, etc., can solve problems such as increased manufacturing costs, affecting battery output power and service life, and unfavorable commercial production
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Embodiment 1
[0013] After cleaning and drying the stainless steel bipolar plate, put it into the vacuum chamber of the arc ion plating equipment, install pure chromium targets on all cathode arc source positions, and vacuumize to 5×10 -3 Pa, pass argon gas to 0.8Pa, add 800V×20kHz×40% pulse bias voltage to trigger glow plasma to clean the bipolar plate by ion sputtering for 10 minutes, reduce the bias voltage amplitude to 500V, and change the partial pressure of argon gas At 0.4Pa, start the chromium cathode arc, set the arc flow at 80A, start to deposit pure chromium layer, the time is 5 minutes, then feed nitrogen, the flow rate is 100sccm, start to deposit chromium nitride layer, the duration is also 5 minutes, and then Then stop sending nitrogen gas, and then pass nitrogen gas after 5 minutes... Repeat this alternately. The total deposition and coating time is 40 minutes. bipolar plate. In this way, a modified film with a synthetic chromium / chromium nitride multilayer structure is dep...
Embodiment 2
[0015] Put the stainless steel bipolar plate into the vacuum chamber of the arc ion plating equipment after cleaning and drying, install pure chromium targets on half of the cathode arc source positions, and install chromium-nickel targets on the other half of the arc source positions opposite to each other, and vacuumize to 5×10 -3 Pa, pass argon gas to 0.8Pa, add 800V×20kHz×40% pulse bias voltage to trigger glow plasma to clean the bipolar plate by ion sputtering for 10 minutes, reduce the bias voltage amplitude to 500V, and change the partial pressure of argon gas 0.4Pa, start the chromium cathode arc and the chromium-nickel cathode arc, the arc current is set at 80A, start to deposit the pure chromium-nickel layer, the time is 5 minutes, then feed nitrogen, the flow rate is 100sccm, start to deposit the chromium-nickel nitride layer, The duration is also 5 minutes, then stop sending nitrogen gas, and then pass nitrogen gas after 5 minutes... This is repeated alternately, a...
Embodiment 3
[0017] Put the stainless steel bipolar plate into the vacuum chamber of the arc ion plating equipment after cleaning and drying, install pure chromium targets on half of the cathode arc source positions, and install graphite targets on the other half of the arc source positions opposite to each other. 5×10 -3 Pa, pass argon gas to 0.8Pa, add 800V×20kHz×40% pulse bias voltage to trigger glow plasma to clean the bipolar plate by ion sputtering for 10 minutes, reduce the bias voltage amplitude to 500V, and change the partial pressure of argon gas 0.4Pa, start the chromium cathode arc and the graphite cathode arc, the arc current is set at 80A, and the time is 40 minutes. In this way, a diamond-like carbon (DLC) modified film doped with metal chromium is deposited on the surface of the bipolar plate, and the contact resistance of the film is ≤20mΩ·cm 2 (under 0.8MPa), simulated corrosion current i in PEMFC corrosion environment cor ≤1.0×10 -8 A / dm 2 , water contact angle ≥ 90°...
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