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Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters

A through-hole and masking layer technology, applied in the production of through-hole foil and its application in the production of micron and sub-micron filters, can solve the problems of high raw material cost, unstable corrosion resistance, limitations, etc., and achieve high Productivity, high separation reliability, effect of eliminating clogging

Inactive Publication Date: 2006-09-13
CENT NAT DE LA RECHERCHE SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Unfortunately, the technique has many drawbacks and limitations, namely: i) The silicon wafer needs to be thinned (typically 500 microns to a few tenths of a micron) in order to avoid excessive head loss for flux (flow) through the filter ; ii) the method is limited to the largest wafer size available; iii) excessive raw material costs (thick single crystals, which are not compatible with filters used in industrial filtration); iv) use of brittle materials for fabrication brittleness of the filter (shock, stress); v) impossibility to shape the resulting filter (tube, closure); vi) unstable corrosion resistance (corrosion by strong alkalis and certain acid solutions)

Method used

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  • Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
  • Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
  • Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters

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Experimental program
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Embodiment Construction

[0067] exist figure 1 , the upper part of the figure is a vertical cross-sectional view of a part of the foil including the cells, and the lower part of the figure is a partial top view of the foil.

[0068] As an example, the foil is a metal foil, such as molybdenum foil, having a thickness of 10 microns, and the holes form a square grid (array), each hole having a diameter of 0.5 microns and a depth of 10 microns (i.e. a form factor of 20) , the interval is 0.5 microns, that is, the unit area density is 10 8 hole / cm 2 .

[0069] Implement the following steps to manufacture the grid ( figure 2 ):

[0070] (1) depositing a masking layer M consisting of an aluminum layer with a thickness of 1 micrometer on the foil F;

[0071] (2) Depositing a photosensitive resin layer R with a thickness of 1.2 microns on the masking layer;

[0072] (3) transfer the grid image to the resin R by interference method, and develop the resin by microelectronic technology;

[0073] (4) using...

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Abstract

The method comprises the following steps: preparing a sheet having thickness of 5 mum to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.

Description

technical field [0001] The present invention relates to a method for the production of perforated foils (sheets) and perforated membranes for the production of micron and submicron filters with calibrated (scaled) cylindrical pores, to said foils thus obtained, membranes and filters. Background technique [0002] Said filters are used in a very wide range of technical fields, such as air filtration, more generally gas filtration, liquid effluent filtration, in particular tangential filtration, powder separation or powder size classification filtration. [0003] Such filters are used in the agro-food processing industry, in the pharmaceutical industry, in the treatment of gaseous or liquid emissions, in the production and supply of dust-free pure gases, and more generally in all industrial fields requiring separation and filtration steps There are applications. [0004] Fabrication of microporous grids (or grids of holes) in dielectric materials, composite materials (photon...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D67/00G03F7/00G03F7/12B01D69/02B01D39/16B01D69/06B01D71/02
CPCB01D67/0062B01D69/02B01D71/022B01D2323/34G03F7/0015B01D67/003B01D67/0034B01D39/16B01D2325/021Y10T428/24273
Inventor T·拉加德J·佩尔蒂埃A·拉科斯特Y·A-M·阿纳尔
Owner CENT NAT DE LA RECHERCHE SCI
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