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Online high-space and time-resolved extreme ultraviolet radiation damage pumping-detection system

A time-resolved, radiation-damaged technology, applied in measurement devices, analytical materials, instruments, etc., can solve the problems of limited machine time, bulky, expensive construction, etc., to improve the imaging signal-to-noise ratio, high energy stability, high The effect of positional stability

Pending Publication Date: 2022-05-24
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The FLASH extreme ultraviolet free electron laser in Hamburg, Germany is generated by the self-amplification of spontaneous emission (SASE) mode. This working mode has the problem of extreme ultraviolet light pulse arrival time jitter, which affects the pump-probe time resolution, and requires a lot of time before the experiment. Time to commission and install additional instruments
In addition, as a large-scale scientific device, the free electron laser has the disadvantages of bulky equipment, high cost, limited experimental machine time, and inability to carry out experiments in a timely and effective manner.
[0005] To sum up, the following problems have not been solved in EUV damage pump-probe experiments: 1. No one has set foot in EUV nanosecond damage pump-probe experiments
2. The time jitter of the extreme ultraviolet pulse output by the free electron laser is large, and it takes a lot of time to solve the time synchronization problem before carrying out the pump-probe experiment, and the free electron laser is a super-large light source, which is expensive and has limited time, so it is not convenient to carry out damage experiments at any time Research
3. There is still a lack of a laboratory-based EUV nanosecond damage pump-detection experimental test system

Method used

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  • Online high-space and time-resolved extreme ultraviolet radiation damage pumping-detection system
  • Online high-space and time-resolved extreme ultraviolet radiation damage pumping-detection system
  • Online high-space and time-resolved extreme ultraviolet radiation damage pumping-detection system

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Effect test

Embodiment 1

[0035] like figure 1 As shown, this embodiment provides an online high spatial and temporal resolution EUV radiation damage pump-detection system, which can be conveniently placed on a laboratory optical platform for experiments, including a laser light source assembly 1, a laser plasma light source assembly 2. The EUV nanosecond pumping optical circuit assembly 3, the infrared femtosecond detection imaging optical circuit assembly 5 and the laser time delay detection assembly 6, the laser plasma light source assembly 2 and the EUV nanosecond pumping optical circuit assembly 3 are formed for placing the sample 803 The vacuum cavity, wherein the laser light source assembly 1 includes an infrared femtosecond laser 101 and an infrared nanosecond laser 104, and the infrared femtosecond laser 101 and the infrared nanosecond laser 104 generate infrared femtosecond detection laser and infrared nanosecond based on the set timing control The pump light and the infrared nanosecond pump ...

Embodiment 2

[0056] On the basis of Embodiment 1, the EUV nanosecond pump light energy attenuation component 4 is used to change the EUV nanosecond pump light energy in this embodiment, and the EUV nanosecond pump light energy attenuation component 4 includes needles connected in sequence. The valve 401, the capillary tube 402, the pressure reducing valve 403, the gas cylinder 404, and the needle valve 401 are connected to the vacuum chamber.

[0057] Further, in this embodiment, the vacuum assembly 7 is used to measure and adjust the degree of vacuum through the vacuum assembly 7. The vacuum assembly 7 includes a vacuum gauge 701, a vacuum gauge 702, a hand valve 703, a mechanical pump 704 and a molecular pump 705, and the vacuum gauge 701 and the hand valve 705. The valves 703 are all connected to the vacuum chamber, the vacuum gauge 702 is connected to the vacuum gauge 701 , the mechanical pump 704 , the molecular pump 705 and the hand valve 703 are connected in sequence, and the pumping...

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Abstract

The invention relates to an online high space and time resolution extreme ultraviolet radiation damage pumping-detection system, which comprises a laser light source assembly, a laser plasma light source assembly, an extreme ultraviolet nanosecond pumping light path assembly, an infrared femtosecond detection imaging light path assembly and a laser delay detection assembly, the laser plasma light source assembly and the extreme ultraviolet nanosecond pump light path assembly form a vacuum cavity used for placing a sample, the laser light source assembly comprises an infrared femtosecond laser and an infrared nanosecond laser, infrared femtosecond detection laser and infrared nanosecond pump light are generated based on set time sequence control, and the infrared femtosecond detection laser and the infrared nanosecond pump light are connected with the extreme ultraviolet nanosecond pump light path assembly. The infrared nanosecond pump light generates extreme ultraviolet nanosecond pump light and irradiates a sample to form a damaged area, the infrared femtosecond detection light irradiates the damaged area of the sample, scattered light of the damaged area is imaged through the extreme ultraviolet nanosecond pump light path assembly and the infrared femtosecond detection imaging light path assembly, and a morphology graph of the damaged area of the sample is obtained. Compared with the prior art, the method has the advantages of simplicity in installation and adjustment, high repeatability and the like.

Description

technical field [0001] The invention relates to the field of observation of the damage kinetic process of materials under extreme ultraviolet light irradiation, in particular to an online high space and time resolution extreme ultraviolet radiation damage pump-detection system. Background technique [0002] In recent decades, with the development of EUV lithography and other technologies, EUV optical components and EUV lithography materials are indispensable components and materials for the development and application of this technology. The damage of optical components and the radiation etching process of lithography materials under EUV irradiation are important scientific and technical issues in the development of EUV lithography technology. Therefore, online monitoring of the damage kinetics of EUV optical components and lithography materials is very important for the development and application of EUV lithography technology. In addition, the research on the kinetics of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N17/00G01B11/28
CPCG01N17/004G01B11/285
Inventor 李文斌潘刘洋李淑慧马彬王占山
Owner TONGJI UNIV
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