Heterojunction structure and photoelectric detector based on platinum diselenide and silicon, and preparation method of heterojunction structure and photoelectric detector
A photodetector and silicon heterojunction technology, applied in nanotechnology, circuits, electrical components, etc. for materials and surface science, can solve problems such as lower specific detection rate, weaker ability to detect weak light, and high dark current , to achieve the effects of low preparation cost, excellent stability and low dark current
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[0082] combine figure 1 and figure 2 The basic structure and preparation steps of the photodetector of the present invention are illustrated as follows:
[0083] 1. Prepare a clean Si substrate with a 285nm oxide layer (i.e. SiO 2 / Si). SiO 2 / Si slices were cut into 16×16mm square substrates, put them into acetone, absolute ethanol, and deionized water for ultrasonic cleaning, and finally took them out and dried them with nitrogen;
[0084] 2. Use the conventional micro-nano processing technology, that is, photolithography, including preparation of photoresist, exposure, development, etc. 2 / Si substrate defines the working area;
[0085] 3. Corrosion of SiO in the working area 2 . SiO with a working area (pattern) set 2 / Si substrate is etched in the prepared hydrofluoric acid buffer solution for an appropriate time, and the SiO in the working area 2 layer etched away, then removed and rinsed in deionized water;
[0086] 4. Remove glue. SiO will be in the working...
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