High-emissivity surface toughening coating and preparation method thereof
A high-emissivity coating technology, applied in the field of heat-resistant insulation materials, can solve the problems of insufficient high-temperature oxidation resistance and erosion resistance, and achieve the effects of meeting thermal protection requirements, enhancing wettability, and moderate viscosity
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Embodiment 1
[0029] (1) Preparation of silica shell-coated high-emissivity powder: using atomic layer deposition technology, using aminopropyltriethoxysilane as the silicon source, water as the oxygen source, and nitrogen as the purge gas, in TaSi 2 、MoSi 2 and SiB 4 A 5nm silica shell layer was deposited on the surface of the three powders to obtain a silica shell-coated high-emissivity powder.
[0030] (2) Take by weighing 70% of the mass percentage of quartz powder and 30% of the mass percentage of boron oxide powder in a mixing tank and mix them by ball milling, then place them in a furnace at 1200°C for 4 hours, take them out and cool them rapidly to obtain a glass frit, and then Vibration crushing and grinding into powder for later use;
[0031] (3) Preparation of the inner layer coating: Weigh 50% by mass of glass powder, 2% by mass of silicon dioxide shell coated silicon tetraboride, 15% by mass of silica shell coated Molybdenum disilicide and tantalum disilicide powder coated w...
Embodiment 2
[0037] (1) Preparation of silica shell-coated high-emissivity powder: using atomic layer deposition technology, using aminopropyltriethoxysilane as the silicon source, water as the oxygen source, and nitrogen as the purge gas, in TaSi 2 、MoSi 2 and SiB 4 A 15nm silica shell layer was deposited on the surface of the three powders to obtain a silica shell-coated high emissivity powder.
[0038](2) Quartz powder of 85% by mass and boron oxide powder of 15% by mass are mixed by ball milling in a mixing tank, then placed in a furnace at 1200°C for 6 hours, taken out and quenched to obtain a glass frit. Vibration crushing and grinding into powder for later use;
[0039] (3) Preparation of the inner layer coating: take 40% by mass of glass powder, 5% of the total mass percent of the silica shell coated silicon tetraboride, 20% of the mass percent of the silica shell coating Molybdenum disilicide and tantalum disilicide powder coated with 35% silicon dioxide shell layer, take ethan...
Embodiment 3
[0045] (1) Preparation of silica shell-coated high-emissivity powder: using atomic layer deposition technology, using aminopropyltriethoxysilane as the silicon source, water as the oxygen source, and nitrogen as the purge gas, in TaSi 2 、MoSi 2 and SiB 4 A 30nm silica shell layer was deposited on the surface of the three powders to obtain a silica shell-coated high-emissivity powder.
[0046] (2) Take by weighing 90% by mass of quartz powder and 10% by mass of boron oxide powder and mix them by ball milling in a mixing tank, then place them in a furnace at 1300°C for 6 hours, take them out and cool them rapidly to obtain a glass frit, and then Vibration crushing and grinding into powder for later use;
[0047] (3) Preparation of the inner layer coating: Weigh 45% by mass of glass powder, 3% by mass of silicon dioxide shell coated silicon tetraboride, 15% by mass of silica shell coated Molybdenum disilicide and tantalum disilicide powder coated with 37% silica shell layer, t...
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