Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for manufacturing ultrathin glass by etching

An ultra-thin glass and etching technology, applied in coatings and other directions, can solve problems such as weakening the compressive strength and toughness of glass substrates, broken screens, uneven stress distribution on the glass surface, etc., to improve structural stability and mechanical strength. , prevent chipping, improve the effect of optical performance

Pending Publication Date: 2021-03-26
凯盛科技股份有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Since ultra-thin glass is mainly thinned by chemical etching with hydrofluoric acid, the original defects on the glass surface will be further exposed and enlarged, resulting in uneven stress distribution on the glass surface. When used for mobile phone touch screen cover, it will weaken the glass substrate. Compressive strength and toughness, it is very easy to break the screen, and the broken screen is also the most common problem in the use of smartphones

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing ultrathin glass by etching
  • Method for manufacturing ultrathin glass by etching
  • Method for manufacturing ultrathin glass by etching

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The method for making ultra-thin glass by etching: adopt etchant A and etchant B to etch respectively, use Ca 2+ , Mg 2 + After the surface is modified, the surface is treated with a hydrophobic repair solution; specifically, the following steps are included:

[0032] S1: Cleaning: Wipe the glass substrate with a thickness of 200 μm with absolute ethanol to remove surface grease, rinse twice with water, and air dry naturally;

[0033] S2: The first etching treatment: immerse the glass substrate after cleaning in S1 in etching solution A, ultrasonically treat at 25°C, etch and thin the glass substrate until the thickness of the glass substrate is 100 μm, and wash and dry;

[0034] The etching solution A uses water as a solvent and includes the following molar concentration components: hydrofluoric acid 1.5 mol / L, hydrochloric acid 0.5 mol / L, sodium fluorosilicate 1.0 mol / L, sodium lauryl sulfate 0.1 mol / L ;

[0035] S3: second etching treatment: place the glass subst...

Embodiment 2

[0041] The method for making ultra-thin glass by etching: adopt etchant A and etchant B to etch respectively, use Ca 2+ , Mg 2 + After the surface is modified, the surface is treated with a hydrophobic repair solution; specifically, the following steps are included:

[0042] S1: Cleaning: Wipe the glass substrate with a thickness of 300 μm with absolute ethanol to remove surface grease, then rinse with water for 3 times, and let it dry naturally;

[0043] S2: The first etching treatment: immerse the glass substrate after cleaning in S1 in etching solution A, ultrasonically treat at 25°C, etch and thin the glass substrate until the thickness of the glass substrate is 125 μm, and wash and dry;

[0044] The etching solution A uses water as a solvent and includes the following molar concentration components: 2 mol / L hydrofluoric acid, 1 mol / L hydrochloric acid, 1.2 mol / L sodium fluorosilicate, and 0.15 mol / L sodium lauryl sulfate;

[0045] S3: second etching treatment: place the ...

Embodiment 3

[0051] The method for making ultra-thin glass by etching: adopt etchant A and etchant B to etch respectively, use Ca 2+ , Mg 2 + After the surface is modified, the surface is treated with a hydrophobic repair solution; specifically, the following steps are included:

[0052] S1: Cleaning: Wipe the glass substrate with a thickness of 400 μm with absolute ethanol to remove surface grease, then rinse with water for 3 times, and let it dry naturally;

[0053] S2: The first etching treatment: immerse the glass substrate after cleaning in S1 in etching solution A, ultrasonically treat at 25°C, etch and thin the glass substrate until the thickness of the glass substrate is 150 μm, and wash and dry;

[0054] The etching solution A uses water as a solvent and includes the following molar concentration components: 3 mol / L hydrofluoric acid, 1.5 mol / L hydrochloric acid, 1.5 mol / L sodium fluorosilicate, and 0.2 mol / L sodium lauryl sulfate;

[0055] S3: second etching treatment: place t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Particle sizeaaaaaaaaaa
Particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for manufacturing ultrathin glass by etching. The method comprises the following steps: respectively etching by using an etching solution A and an etching solution B,carrying out surface modification by using Ca < 2 + > and Mg < 2 + >, and carrying out surface treatment by using a hydrophobic repair solution, wherein the etching solution A takes water as a solventand comprises the following components in molar concentration: 1.5-3mol / L of hydrofluoric acid, 0.5-1.5 mol / L of hydrochloric acid, 1.0-1.5 mol / L of sodium fluosilicate and 0.1-0.2 mol / L of lauryl sodium sulfate; the etching solution B takes water as a solvent and is prepared from the following components in molar concentration: 0.5-1.5 mol / L of hydrofluoric acid, 0.3-0.8 mol / L of hydrochloric acid, 0.5-0.8 mol / L of sodium fluosilicate and 0.1-0.2 mol / L of lauryl sodium sulfate; the hydrophobic repair liquid comprises the following components in parts by mass: 40-50 parts of water-based fluorocarbon emulsion, 1-3 parts of a hydrophobic agent, 5-7 parts of sodium silicate, 2-3 parts of sodium fluoride, 10-15 parts of nano titanium oxide sol, 15-20 parts of nano silicon oxide sol, 3-5 partsof a structure directing agent, 1-2 parts of an amino silane coupling agent and 0.5-2 parts of an emulsifier. According to the method, the defect position on the surface of the etched glass substrateis repaired, and the structural stability and the mechanical strength are improved; and the glass is endowed with flexibility to prevent the ultrathin glass from being broken.

Description

technical field [0001] The invention belongs to the technical field of glass etching, in particular to a method for etching and manufacturing ultra-thin glass. Background technique [0002] Ultra-thin glass is a manifestation of the trend of thinner and lighter global consumer electronics products. In terms of smartphones and notebook computers, it is also gradually developing in a more ultra-thin direction. With the maturity of related software and hardware industries and higher requirements for thinning applications, ultra-thin glass has also been widely used in mobile phone covers. [0003] Since ultra-thin glass is mainly thinned by chemical etching with hydrofluoric acid, the original defects on the glass surface will be further exposed and enlarged, resulting in uneven stress distribution on the glass surface. When used for mobile phone touch screen cover, it will weaken the glass substrate. The compressive strength and toughness are very prone to the problem of broke...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C15/00C03C23/00C03C17/00
CPCC03C15/00C03C23/0095C03C17/002C03C17/009C03C2217/40C03C2217/732C03C2217/70C03C2218/11C03C2218/365Y02P40/57
Inventor 倪植森张少波陈诚杨金发彭程许波钟汝梅李俊琛邵帅罗丹
Owner 凯盛科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products