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Diphenolic acid type polyarylether dielectric material with side chain containing methylsulfonyl and preparation method thereof

A technology of bisphenolic acid type and dielectric material is applied in the field of bisphenolic acid type polyarylene ether dielectric material and its preparation to achieve the effects of increasing orientation polarization, easy realization of preparation conditions and increasing polarizability

Pending Publication Date: 2020-05-22
CHANGAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Polyether ether ketone, polyarylether nitrile and polyarylether sulfone are common polyarylether resins, which have mechanical strength close to that of nylon materials, good processability, heat resistance, excellent fatigue resistance, and good biological phase. Capacitance and other outstanding advantages are expected to be applied in many fields, but the electronic field requires polymer dielectric materials to achieve high energy storage, and most of the current polyarylether materials have low dielectric constants, so the development of a high dielectric material New polymer dielectric materials with constant, low loss and high temperature resistance are of great significance to improve the performance of electronic components

Method used

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  • Diphenolic acid type polyarylether dielectric material with side chain containing methylsulfonyl and preparation method thereof
  • Diphenolic acid type polyarylether dielectric material with side chain containing methylsulfonyl and preparation method thereof
  • Diphenolic acid type polyarylether dielectric material with side chain containing methylsulfonyl and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] Example 1: PEEK-SO 2 Synthesis,

[0045] Step 1, put bisphenolic acid, potassium carbonate, and potassium hydroxide into a reactor with a condensing tube in a molar ratio of 1:1.4:0.3, and add toluene and N-formaldehyde according to a volume ratio of 1:3 1-pyrrolidone, under the protection of nitrogen, reflux at 120°C for 1 hour, cool to room temperature, then add 4,4'-difluorobenzophenone, reflux at 140°C for 2 hours, remove the water and toluene in the reaction system, at 168°C Lower reaction 5h;

[0046] Step 2, the product of step 1 is poured into acetone while it is hot, soaked in hydrochloric acid for 24 hours, filtered and dried, and then dissolved in N,N-dimethylformamide, wherein the product is mixed with N,N-dimethyl The ratio of formamide is 1g:8mL, the solution is added dropwise to deionized water to precipitate, after three times of washing, suction filtration and drying, PEEK-COOH is obtained;

[0047] Step 3, weigh 2 g of purified PEEK-COOH and place i...

Embodiment 2

[0057] Example 2: PAEN-SO 2 Synthesis,

[0058] Step 1, put bisphenolic acid, potassium carbonate, and potassium hydroxide into a reactor with a condensing tube in a molar ratio of 1:1.5:0.4, and add toluene and N-formaldehyde in a volume ratio of 1:3 Base pyrrolidone, under the protection of nitrogen, reflux at 130°C for 2 hours, cool to room temperature, then add 2,6-dichlorobenzonitrile, reflux at 150°C for 3 hours, remove the water and toluene in the reaction system, and react at 175°C 6h;

[0059] Step 2, the product of step 1 is poured into acetone while it is hot, soaked in hydrochloric acid for 24 hours, filtered and dried, and then dissolved in N,N-dimethylformamide, wherein the product is mixed with N,N-dimethyl The ratio of formamide is 1g:8mL, the solution is added dropwise to deionized water to precipitate, after 5 times of washing, suction filtration and drying to obtain PAEN-COOH;

[0060] Step 3, weigh 2g of purified PAEN-COOH and place it in a round bottom ...

Embodiment 3

[0067] Example 3: PAES-SO 2 Synthesis,

[0068] Step 1, put bisphenolic acid, potassium carbonate, and potassium hydroxide into a reactor with a condensing tube in a molar ratio of 1:1.6:0.4, and add toluene and N-formaldehyde in a volume ratio of 1:3 Under the protection of nitrogen, reflux at 140°C for 3 hours, cool to room temperature, then add 4,4'-difluorodiphenyl sulfone, reflux at 160°C for 5 hours, remove the water and toluene in the reaction system, at 185°C Reaction 7h;

[0069] Step 2, the product of step 1 is poured into acetone while it is hot, soaked in hydrochloric acid for 24 hours, filtered and dried, and then dissolved in N,N-dimethylformamide, wherein the product is mixed with N,N-dimethyl The ratio of formamide is 1g: 8mL, the solution is added dropwise to deionized water to precipitate, and after 4 times of washing, suction filtration and drying, PAES-COOH is obtained;

[0070] Step 3, weigh 2 g of the purified PAES-COOH and place it in a round bottom f...

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Abstract

The invention discloses a diphenolic acid type polyarylether dielectric material with a side chain containing methylsulfonyl and a preparation method thereof. The method comprises the following steps:1, carrying out a reflux reaction on diphenolic acid, potassium carbonate, potassium hydroxide and a dehydrating agent in a polar aprotic solvent in a protective atmosphere, adding a dihalogenated aromatic compound monomer, removing water and the dehydrating agent, reacting at 160-190 DEG C, pouring the reaction solution into acetone, adding an acid solution, soaking, and separating a product; 2,reacting for 1-36 hours at room temperature in a protective atmosphere; and 3, reacting the product with methylsulfonyl alcohol at room temperature for 24-72 hours in a protective atmosphere, then separating, and drying to obtain the diphenolic acid type polyarylether dielectric material with the methylsulfonyl-containing side chain. According to the invention, the dielectric constant is increased by utilizing the rotation of ester groups and methylsulfonyl groups on the side chain of the diphenolic acid type polyarylether polymer; meanwhile, introduction of a diphenolic acid structure and alarge number of ether bonds ensures that the dielectric material can maintain rigidity, and a polymer film with good heat resistance and excellent mechanical properties can be obtained.

Description

technical field [0001] The invention belongs to the technical field of polymer dielectric materials, in particular to a bisphenolic acid type polyarylether dielectric material containing methylsulfone groups in the side chain and a preparation method thereof. Background technique [0002] With the rapid development of electronics, information, electric power and other industries, capacitors are gradually developing in the direction of miniaturization, high energy storage, multi-functionality, and environmental friendliness. Therefore, higher requirements are put forward for dielectric materials, that is, dielectric materials. Polymer dielectric materials have the advantages of high breakdown field strength, low dielectric loss, self-healing, easy processing, and environmental friendliness, and can better make up for the disadvantages of traditional ceramic materials such as difficult processing and low breakdown field strength. The rapid development of polymer dielectric mat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G65/40C08G65/48C08G75/23
CPCC08G65/405C08G65/4031C08G75/23C08G65/48C08G65/4093
Inventor 魏俊基黄雯晏妮宋家乐王凤燕
Owner CHANGAN UNIV
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