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Zirconium nitride aluminum/aluminium oxide composite coating firmly combined with hard alloy and preparation method thereof

A technology with strong combination and zirconium-aluminum nitride, which is applied in metal material coating process, coating, ion implantation plating, etc., can solve the problems of insufficient energy, obstruction, and low deposition temperature, so as to avoid low hardness and solve the problem of bonding The effect of low strength and high toughness

Active Publication Date: 2020-01-07
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the low temperature of PVD coating technology makes this method suitable for preparing Al with α crystal structure. 2 o 3 hindered, because the deposition temperature is too low and the energy is insufficient, the deposited Al 2 o 3 Usually amorphous or in another type of crystalline structure

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Put the clean cemented carbide substrate into the vacuum chamber of the plasma-enhanced compound ion coating system, and when the vacuum of the back is evacuated to 0.05Pa, turn on the auxiliary heating device on the furnace wall to heat the substrate, and turn on the rotating power supply at the same time to make the substrate Rotate continuously, heat until the substrate temperature reaches 380°C; then pass argon gas into the vacuum chamber, adjust the flow rate of argon gas to ensure the pressure is 0.2Pa, and then apply a DC bias voltage of -200V and a pulse bias voltage of -400V to the substrate , using the ionized Ar + Etch the surface of the substrate for 80 minutes; turn off the bias voltage of the substrate in turn, adjust the flow of argon gas to ensure that the working pressure is 0.15Pa, turn on the main arc power supply of evaporation plating for evaporation coating, the main arc current on the crucible is 180A, and evaporate the raw material for Co 0.15 N...

Embodiment 2

[0028] Put the clean cemented carbide substrate into the vacuum chamber of the plasma-enhanced composite ion coating system, and when the vacuum of the back is evacuated to 0.05Pa, turn on the auxiliary heating device on the furnace wall to heat the substrate, and at the same time turn on the rotating power to make the substrate Rotate continuously, heat until the substrate temperature reaches 380°C; then pass argon gas into the vacuum chamber, adjust the flow rate of argon gas to ensure the pressure is 0.15Pa, and then apply a DC bias voltage of -200V and a pulse bias voltage of -300V to the substrate , using the ionized Ar + Etch the surface of the substrate for 30 minutes; turn off the bias voltage of the substrate in turn, adjust the flow of argon to ensure that the working pressure is 0.2Pa, turn on the main arc power supply of evaporation plating for evaporation coating, the main arc current on the crucible is 220A, and evaporate the raw material for Co 0.2 Ni 0.2 Cr ...

Embodiment 3

[0030] Put the clean cemented carbide substrate into the vacuum chamber of the plasma-enhanced composite ion coating system, and when the vacuum of the back is evacuated to 0.05Pa, turn on the auxiliary heating device on the furnace wall to heat the substrate, and at the same time turn on the rotating power to make the substrate Rotate continuously, heat until the substrate temperature reaches 380°C; then pass argon gas into the vacuum chamber, adjust the flow rate of argon gas to ensure the pressure is 0.15Pa, and then apply a DC bias of -100V and a pulse bias of -200V to the substrate , using the ionized Ar + Etch the surface of the substrate for 90 minutes; turn off the bias voltage of the substrate in turn, adjust the flow of argon to ensure that the working pressure is 0.2Pa, turn on the main arc power supply of evaporation plating for evaporation coating, the main arc current on the crucible is 205A, and evaporate the raw material for Co 0.2 Ni 0.2 Cr 0.2 al 0.2 Y 0...

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PUM

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Abstract

The invention discloses a zirconium nitride aluminum / aluminium oxide composite coating firmly combined with a hard alloy. The zirconium nitride aluminum / aluminium oxide composite coating is a whole composed of five sublayers of a CoNiCrAlY high entropy alloy bonding layer, an alpha-Cr2O3 oxide template layer, an alpha-Al2O3 oxide supporting layer, a AlZrON nitric oxide cohesion layer and a AlZrN nitride wearing layer, wherein the five sublayers are arranged from the inside to outside in sequence, and the total thickness of the coating is 1-2.5 microns. A preparation method of the coating comprises the following steps that after a hard alloy substrate is heated and subjected to ion etching, firstly, a CoNiCrAlY layer is deposited on the substrate by using an electric arc evaporation platingprocess, and then the alpha-Cr2O3 layer, the alpha-Al2O3 layer, the AlZrON layer, and the AlZrN layer are sequentially deposited by using a magnetron sputtering process. The high entropy alloy bonding layer is adopted, different functional sub-layers cooperate with one another, so that the bonding between the coating and the hard alloy substrate is firm, the comprehensive performance of the coating is excellent, the process is simple, and the implementation is easy.

Description

technical field [0001] The invention belongs to the technical field of cutting tool surface coatings, in particular to a zirconium aluminum nitride / alumina composite coating firmly combined with hard alloy and a preparation method thereof. Background technique [0002] Surface coating is an important way to modify the surface of cutting tools. The preparation methods of the coating on the tool mainly include two types: chemical vapor deposition technology (CVD) and physical deposition technology (PVD). Compared with CVD technology, PVD technology has the characteristics of low deposition temperature, little influence on the properties of tool substrate materials, and a wide range of applicable tool substrate materials, especially the hard coating prepared by magnetron sputtering technology in PVD. The advantage of good surface quality is very important for precision machining. However, PVD coating technology has a shortcoming, that is, the energy of the deposited particles...

Claims

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Application Information

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IPC IPC(8): C23C14/32C23C14/35C23C14/02C23C14/16C23C14/08C23C14/06C22C30/00
CPCC22C30/00C23C14/0021C23C14/022C23C14/0641C23C14/0676C23C14/081C23C14/083C23C14/16C23C14/325
Inventor 鲜广鲜丽君赵海波
Owner SICHUAN UNIV
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