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Monocrystalline silicon texturing additive formula containing alkyl glycoside and use method

A technology of alkyl glycosides and additives, which is applied in the field of monocrystalline silicon wafers for solar cells, can solve problems such as high cost and strong toxicity of IPA, and achieve the effects of increasing yield, reducing texturing time, and improving texturing effect

Inactive Publication Date: 2020-01-03
HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, IPA has strong toxicity and high cost, so it is unfavorable to use it in large quantities in industrial production

Method used

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  • Monocrystalline silicon texturing additive formula containing alkyl glycoside and use method
  • Monocrystalline silicon texturing additive formula containing alkyl glycoside and use method
  • Monocrystalline silicon texturing additive formula containing alkyl glycoside and use method

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] 1) Additive preparation: use 100mL deionized water as solvent, add 1.0g of APG0810, 1.2g of maltose, 0.2g of sodium isophthalate, 0.3g of NaCl, and 0.4g of sodium silicate to fully dissolve; 2) Preparation of velvet solution: 1 L Add 30.0mL of NaOH solution with a concentration of 30% by weight in deionized water, and add 15.0mL of additives to obtain an alkaline texturizing solution; 3) Pre-cleaning solution preparation: add 30% by weight of NaOH solution 10mL, K 2 MnO 4 0.8mol, fully dissolved; 4) Preparation of mixed acid solution: prepare mixed acid concentration of 1.5 mol / L with HF and HCl at a molar ratio of 1:2; 5) Place the cut monocrystalline silicon wafer in a pre-cleaning solution at 65°C After cleaning for 5 minutes, wash with deionized water, and then immerse the monocrystalline silicon wafer in the texturing solution. The temperature of the texturing solution is 80 ° C, and the texturing time is 14 minutes; Wash in water for 1.5 min, then wash with mix...

Embodiment 2

[0029]1) Additive preparation: use 100mL deionized water as a solvent, add 1.2g of APG1214, 1.5g of sucrose, 0.1g of sodium benzoate, 0.2g of KCl, and 0.2g of sodium silicate to fully dissolve; 2) Preparation of texturing solution: 1 L deionized Add 35.0mL of NaOH solution with a concentration of 30% by weight in water, and add 12.0mL of additives to obtain an alkaline texturizing solution; 3) Preparation of pre-cleaning solution: add 30% NaOH solution with a concentration of 30% by weight in 1 L of deionized water 12mL, H 2 o 2 1.0mol, fully dissolved; 4) Preparation of mixed acid solution: mix HF and H 3 PO 4 Prepare a mixed acid concentration of 2.0 mol / L with a molar ratio of 1:1; 5) Clean the cut monocrystalline silicon wafers in a pre-cleaning solution at 65°C for 8 minutes, then wash them with deionized water, and then immerse the monocrystalline silicon wafers in In the texturing solution, the temperature of the texturing solution is 84°C, and the texturing time is...

Embodiment 3

[0031] 1) Additive preparation: With 100mL deionized water as solvent, add 1.4g of APG0814, 1.8g of lactose, 0.3g of sodium phenylacetate, Na 2 SO 4 0.1g and 0.3g of sodium silicate were fully dissolved; 2) Preparation of texturing solution: 25.0mL of NaOH solution with a concentration of 30% by weight was added to 1 L of deionized water, and 15.0mL of additives were added to obtain an alkaline texturing solution; 3 ) Preparation of pre-cleaning solution: add 15 mL of 30% NaOH solution in 1 L of deionized water, KClO 3 1.4mol, fully dissolved; 4) Preparation of mixed acid solution: mix HF and HNO 3 Prepare a mixed acid concentration of 1.8 mol / L with a molar ratio of 2:1; 5) Clean the cut monocrystalline silicon wafers in a pre-cleaning solution at 65°C for 8 minutes, then wash them with deionized water, and then immerse the monocrystalline silicon wafers in In the texturing solution, the temperature of the texturing solution is 88°C, and the texturing time is 10 minutes; ...

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Abstract

The invention relates to an additive of a monocrystalline silicon wafer texturing solution containing alkyl glycoside. The additive comprises the following components of alkyl glycoside, disaccharide,organic sodium salt, inorganic salt, sodium silicate and the balance of water. The invention also discloses a texturing method of the monocrystalline silicon wafer, and the method comprises the following steps of 1) preparing a texturing additive; 2) preparing a texturing solution; 3) putting the monocrystalline silicon wafer into the texturing solution prepared in the step 2) for texturing, wherein the temperature of the texturing solution is 75-90 DEG C, and the texturing time is 7-15 min; and 4) and cleaning the monocrystalline silicon wafer subjected to the texturing solution by using mixed acid, cleaning the monocrystalline silicon wafer by using deionized water, and drying the monocrystalline silicon wafer to obtain the product. The texturing effect is excellent, the size of the texture pyramid after the texturing is small, the distribution is narrow, the reflection of the light can be effectively reduced, and the photoelectric conversion efficiency of the solar cell can be improved.

Description

technical field [0001] The invention belongs to the technical field of monocrystalline silicon wafers for solar cells, and in particular relates to the effect of the type and content of alkyl-containing glycosides on the texturing of monocrystalline silicon wafers. Background technique [0002] One of the two important issues facing the sustainable development of modern society is the energy issue. While the rapid development of the world economy brings benefits to mankind, it is also accompanied by many disadvantages, that is, the excessive consumption of energy, which will undoubtedly make mankind The society is in a situation of resource shortage, followed by ecological and environmental problems. In order to protect the earth home on which human beings depend, the development of clean energy is imminent. Solar energy is the most important renewable energy because of its huge reserves, high feasibility of utilization, and environmental protection and pollution-free. Hum...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C30B29/06H01L31/0236H01L31/18
CPCC30B29/06C30B33/10H01L31/02363H01L31/1804Y02E10/547Y02P70/50
Inventor 阎建辉邓小梅卢建红张丽杨海华陈婉君刘云芳陈文明
Owner HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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