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Formula of single-crystal silicon texturing additive containing polysaccharide and alcohol

An additive, single crystal silicon wafer technology, applied in the direction of single crystal growth, single crystal growth, polycrystalline material growth, etc., can solve the problem of affecting the photoelectric conversion efficiency of solar cells, the ineffective release of bubbles on the surface of silicon wafers, and affecting the textured light. Absorption effect and other issues, to achieve the effect of shortening texturing time, improving photoelectric conversion efficiency, and excellent texturing effect

Inactive Publication Date: 2020-01-03
HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the degree of corrosion is too low, the air bubbles on the surface of the silicon wafer cannot be released effectively, which will lead to the inability to form uniform surface grooves and pyramid structures on the entire surface of the silicon wafer, which will lead to high reflectivity of the silicon wafer to sunlight; if the degree of corrosion is too high , the already formed pyramid structure will be destroyed and eventually become a relatively large pyramid structure, which is also not conducive to reducing the light reflectivity of the silicon wafer
Therefore, the degree of corrosion is very important for the texture reaction. Finding the optimal corrosion degree has an important impact on the formation of the pyramid structure, and the pyramid structure will also affect the light absorption effect of the texture, and ultimately affect the photoelectric conversion efficiency of the solar cell.

Method used

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  • Formula of single-crystal silicon texturing additive containing polysaccharide and alcohol
  • Formula of single-crystal silicon texturing additive containing polysaccharide and alcohol
  • Formula of single-crystal silicon texturing additive containing polysaccharide and alcohol

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Take the following steps in the texturing process: 1) Additive preparation: use 1L of deionized water as a solvent, add 8.0g of dextrin, 22.0g of tert-butanol, 5.0g of sodium phenylacetate, and 4.0g of sodium silicate to fully dissolve; 2) Texture making Liquid preparation: Add 35.0mL of NaOH solution with a concentration of 30% by weight to 1 L of deionized water, and add 15.0mL of additives to obtain an alkaline texturing liquid; 3) After pre-cleaning the cut monocrystalline silicon wafers, Immerse in the texturing solution, the temperature of the texturing solution is 78°C, and the texturing time is 15 minutes; 4) Wash the monocrystalline silicon wafer after texturing with mixed acid and then with deionized water, and place the product in a drying box The size of the pyramids formed on the surface of the textured monocrystalline silicon wafer after drying is 0.5-3.5 μm, the entire surface of the silicon wafer is uniform in color, the lowest reflectivity is 8.8%, and t...

Embodiment 2

[0027] Take the following steps in the texturing process: 1) Additive preparation: use 1L of deionized water as a solvent, add 6.0g of β-cyclodextrin, 18.0g of n-butanol, 4.0g of sodium benzoate, and 3.0g of sodium silicate to fully dissolve; 2) Preparation of texturing solution: Add 40.0 mL of NaOH solution with a concentration of 30% by weight in 1 L of deionized water, and add 12.0 mL of additives to obtain an alkaline texturing solution; 3) After pre-cleaning the cut monocrystalline silicon wafers, Immerse it in the texturing solution, the temperature of the texturing solution is 82°C, and the texturing time is 12 minutes; 4) The monocrystalline silicon wafer after texturing is cleaned with mixed acid and then washed with deionized water, and the product is placed in a dry place. Dry in an oven to obtain textured monocrystalline silicon wafers.

Embodiment 3

[0029]Take the following steps in the texturing process: 1) Additive preparation: use 1L of deionized water as a solvent, add 4.0g of water-soluble starch, 20.0g of 1,2-propanediol, 3.0g of sodium propionate, and 2.0g of sodium silicate to fully dissolve; 2. ) Preparation of texturing solution: add 42.0 mL of 30% NaOH solution to 1 L of deionized water, add 10.0 mL of additives, and obtain an alkaline texturing solution; 3) pre-clean the monocrystalline silicon wafer after cutting , immerse it in the texturing liquid, the temperature of the texturing liquid is 85°C, and the texturing time is 10 minutes; 4) The monocrystalline silicon wafer after texturing is washed with mixed acid and then washed with deionized water, and the product is placed in Dry in a drying oven to obtain a textured monocrystalline silicon wafer.

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Abstract

The invention relates to an additive of a single-crystal silicon texturing liquid. The components of the additive are a polysaccharide, an alcohol, an organic acid sodium salt, sodium silicate and deionized water, wherein the polysaccharide is one or a mixture of more of water-soluble chitin, polyfructose, water-soluble starch, beta-cyclodextrin, and dextrin, and a weight ratio of the polysaccharide to water is 0.1-1.0:100; the alcohol is a lower alcohol, and is one or a mixture of more of n-propanol, 1,2-propanediol, n-butanol, 1,2-butanediol and tert-butanol, and a weight ratio of the alcohol to water is 1.0-3.0:100; the organic acid sodium salt is one or a mixture of more of sodium acetate, sodium formate, sodium propionate, sodium benzoate, and sodium phenylacetate, and a weight ratioof the organic aicd sodium salt to water is 0.1-1.0:100; and a weight ratio of sodium silicate to water is 0.1-1.0:100. A formula of a single-crystal silicon surface texturing agent is as follows: 30.0-50.0 mL of a NaOH solution with a concentration of 30% by weight is added into 1 L of deionized water, and 8.0-18.0 mL of the additive is added.

Description

technical field [0001] The invention belongs to the technical field of monocrystalline silicon wafers for solar cells, and in particular relates to the effect of the types and contents of polysaccharides and alcohols on the texturing of monocrystalline silicon wafers. Background technique [0002] Renewable energy refers to energy that can be continuously regenerated and reused in the natural environment, and is inexhaustible and inexhaustible. At present, the renewable energy sources discovered mainly include solar energy, water energy, wind energy, biomass energy, wave energy, tidal energy, and geothermal energy. The impact of renewable energy on the environment is harmless or minimal, and the resources are widely distributed, suitable for local development and utilization. Solar energy is the most basic energy in our world. All biomass energy, water energy, geothermal energy, and wind energy come from solar energy. Every year, the earth can obtain 173,000TW of energy fr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C30B29/06
CPCC30B29/06C30B33/10
Inventor 阎建辉邓小梅卢建红张丽杨海华陈婉君邹瑜唐雄强
Owner HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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