Preparation method of wear-resistant hydraulic pump part
A technology of hydraulic pumps and parts, which is applied in the field of preparation of wear-resistant hydraulic pump parts, can solve the problems of mechanically matching PVD coatings with high hardness and low hardness, unsatisfactory performance of coatings, and inability to obtain PVD coatings, etc., so as to improve physical machinery performance, improvement of anti-oxidation performance, effect of improvement of matching performance
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Embodiment 1
[0027] In the wear-resistant hydraulic pump and its preparation method according to the present invention, the base material of the hydraulic pump parts is 40Cr, and the base material of the hydraulic pump parts is subjected to carburizing treatment by ion plating after quenching, high temperature tempering and rough finishing, and then through The combined method of ion plating and magnetron sputtering is used to deposit HfCrMoC carbide coating on the surface. During deposition, 2 C ion plating targets, 1 Hf magnetron sputtering target, 1 Cr magnetron sputtering target and 1 Mo magnetron are used. Sputtering target; Concretely comprises the following steps:
[0028] (1) Part matrix processing: part matrix blank→quenching (860~880℃, water cooling)→high temperature tempering (540~550℃, water cooling)→rough machining→semi-finishing→stress relief tempering (500~530℃, Air cooling)→finishing (surface roughness Ra1.6μm, processing size: lower limit of tolerance);
[0029] (2) Part ...
Embodiment 2
[0038] In the wear-resistant hydraulic pump and its preparation method according to the present invention, the base material of the hydraulic pump parts is 20Cr2Mo, and the base material of the hydraulic pump parts is subjected to quenching, high-temperature tempering, rough and fine machining, and then carburized by ion plating, and then passed through The combined method of ion plating and magnetron sputtering is used to deposit HfCrMoC carbide coating on the surface. During deposition, 2 C ion plating targets, 1 Hf magnetron sputtering target, 1 Cr magnetron sputtering target and 1 Mo magnetron are used. Sputtering target; Concretely comprises the following steps:
[0039] (1) Part matrix processing: part matrix blank→quenching (910~930℃, oil quenching)→high temperature tempering (560~620℃, air cooling)→rough machining→semi-finishing→stress relief tempering (550~600℃ , oil cooling)→finishing (surface roughness Ra1.6μm, processing size: lower limit of tolerance);
[0040] (...
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