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A kind of crfe+(cr,fe)n generation chromium coating and preparation method thereof

A chromium coating and workpiece technology, applied in the field of CrFe+N generation chromium coating and its preparation, can solve the problems of difficult coating competition, narrow process window, high cost of Cr+CrN composite film, etc., and achieve the effect of low cost

Active Publication Date: 2020-12-22
SOUTH CHINA UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Physical vapor deposition (PVD) deposition of thin films is an environmentally friendly coating preparation technology, among which arc ion plating and magnetron sputtering Cr thin film technologies have been mature, but the hardness of pure Cr thin films prepared by arc ion plating and magnetron sputtering Cr thin films is only Hv280~320, far lower than chromium (Ⅵ) coating (Hv800~1200), it is difficult to replace chromium (Ⅵ) coating
Nitrogen gas is introduced during arc ion plating and magnetron sputtering Cr target. Reactive deposition of Cr+CrN composite film can significantly improve the hardness, but the process window is narrow, and it is easy to form CrN film. Although the hardness of CrN film can be as high as Hv2000 or more, it is brittle. , it is difficult to meet the needs of practical applications, and the cost of depositing Cr+CrN composite films with pure Cr is high, and it is difficult to compete with electroplating chromium (Ⅵ) coatings. Thin films still haven't found wider use

Method used

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  • A kind of crfe+(cr,fe)n generation chromium coating and preparation method thereof
  • A kind of crfe+(cr,fe)n generation chromium coating and preparation method thereof
  • A kind of crfe+(cr,fe)n generation chromium coating and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] The method for preparing CrFe+(Cr, Fe)N composite film with CrFe target material containing 10wt.% Fe in this embodiment:

[0028] (1) According to the target size of the magnetron sputtering system, a CrFe target containing Fe10wt.% is ordered;

[0029] (2) Use 40Cr steel as the substrate, polish the substrate to a mirror surface, ultrasonically clean it in acetone and absolute ethanol for 15 minutes, and dry it in an oven at 50°C;

[0030] (3) Install the CrFe alloy sputtering target to the target position connected to the DC sputtering power supply, adjust the distance between the substrate and the target to 80mm, place the dried sample on the sample stage, vacuumize and turn on the infrared baking to 150°C , after pumping to the background vacuum, adjust the substrate heating temperature to 300°C;

[0031] (4) Turn off the vacuum baking, pass Ar gas into the vacuum chamber to 1Pa, apply a negative bias of -900V to the substrate, turn on the DC sputtering system, an...

Embodiment 2

[0036] The method for preparing CrFe+(Cr, Fe)N composite film with CrFe target material containing 5wt.% Fe in this embodiment:

[0037] (1) According to the target size of the magnetron sputtering system, a CrFe target containing Fe5wt.% is ordered;

[0038] (2) Use 40Cr steel as the substrate, polish the substrate to a mirror surface, ultrasonically clean it in acetone and absolute ethanol for 15 minutes, and dry it in an oven at 50°C;

[0039] (3) Install the CrFe alloy sputtering target to the target position connected to the DC sputtering power supply, adjust the distance between the substrate and the target to 80mm, place the dried sample on the sample stage, vacuumize and turn on the infrared baking to 150°C , after pumping to the background vacuum, adjust the substrate heating temperature to 250°C;

[0040] (4) Turn off the vacuum baking, pass Ar gas into the vacuum chamber to 1Pa, apply a negative bias of -900V to the substrate, turn on the DC sputtering system, and ...

Embodiment 3

[0045] The method for preparing CrFe+(Cr, Fe)N composite film with CrFe target material containing 20wt.% Fe in this example:

[0046] (1) According to the target size of the magnetron sputtering system, a CrFe target containing Fe20wt.% is ordered;

[0047] (2) Use 40Cr steel as the substrate, polish the substrate to a mirror surface, ultrasonically clean it in acetone and absolute ethanol for 15 minutes, and dry it in an oven at 50°C;

[0048] (3) Install the CrFe alloy sputtering target to the target position connected to the DC sputtering power supply, adjust the distance between the substrate and the target to 90mm, place the dried sample on the sample stage, vacuumize and turn on the infrared baking to 150°C , after pumping to the background vacuum, adjust the substrate heating temperature to 400°C;

[0049] (4) Turn off the vacuum baking, pass Ar gas into the vacuum chamber to 1Pa, apply a negative bias of -1000V to the substrate, turn on the DC sputtering system, and ...

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Abstract

The invention belongs to the technical field of metallic surface strengthening and discloses a CrFe+(Cr, Fe) N substitute chromium coating and a preparation method thereof. The CrFe+(Cr, Fe) N substitute chromium coating is composed of two phases namely CrFe and (Cr, Fe) N, wherein CrFe is a tough phase, and(Cr, Fe) N is a hard phase. The preparation method comprises the following steps: CrFe alloy is taken as the target material, the pressure is 0.5-1.0 Pa, and in N2 / Ar mixed atmosphere, the partial pressure of N2 is 5-15%, deposition is carried out on the surface of a workpiece matrix through magnetron sputtering to obtain CrFe+(Cr, Fe) N substitute chromium coating. The CrFe+(Cr, Fe) N composite film is higher in hardness than electroplated chromium (VI) coating, and high in toughness,is a tough film, small in internal stress, high in binding force with the matrix, free of the problem of hydrogen embrittlement and target poisoning, wider in range and lower in cost than a Cr+CrN composite film process window.

Description

technical field [0001] The invention belongs to the technical field of metal surface strengthening, and in particular relates to a CrFe+(Cr, Fe)N generation chromium coating and a preparation method thereof. Background technique [0002] The electroplated chromium layer has high hardness, good wear resistance and corrosion resistance, and can maintain the bright metal color for a long time in the atmosphere, so it is widely used as a decorative coating and wear-resistant and corrosion-resistant coating, and has formed a huge industrial and civil market. Although the electroplating chromium (Ⅵ) coating has high hardness, the internal stress is large, and the size of the plated part is unstable. The coating contains high hydrogen, and the workpiece is easy to penetrate into the substrate of the workpiece during application to form a hydrogen embrittlement accident. Therefore, hydrogen can not be used to increase the hardness of the chromium (Ⅵ) coating. Chromium electroplatin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/16C23C14/35
CPCC23C14/0036C23C14/165C23C14/35
Inventor 邱万奇何家毅焦东玲钟喜春刘仲武
Owner SOUTH CHINA UNIV OF TECH
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