Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

TiB2-based coating with multicycle structure and preparation method and application thereof

A titanium diboride, periodic structure technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problem of poor thermal stability and toughness, high residual stress, low self-diffusion coefficient of elemental film, etc. problem, to achieve the effect of low brittleness, good bonding force, and improved high temperature oxidation resistance.

Active Publication Date: 2019-07-23
GUANGDONG UNIV OF TECH
View PDF8 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However TiB 2 The disadvantages of low self-diffusion coefficient, high residual stress, poor thermal stability and toughness of the simple film affect its wide application in related industrial fields.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • TiB2-based coating with multicycle structure and preparation method and application thereof
  • TiB2-based coating with multicycle structure and preparation method and application thereof
  • TiB2-based coating with multicycle structure and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] 1. Preparation:

[0036] S1. Two TiBs are symmetrically installed on the ion coating machine 2 target and two metal targets, TiB 2 The target is a planar target, the atomic ratio of Ti and B is 1:2, and the purity is 99.99%; the metal target is a chromium (Cr) planar target, the purity is 99.99%, and the workpiece support is installed in the middle of the vacuum chamber.

[0037] S2. Cleaning the substrate: send the polished (100) oriented single crystal silicon substrate into an ultrasonic cleaning machine, and perform ultrasonic cleaning with acetone and absolute ethanol for 30 minutes respectively, and then clean it with deionized water, and then wash it with a purity ≥ 99.5% nitrogen blow dry.

[0038] S3. Vacuuming and ion beam etching cleaning chamber: two TiBs are symmetrically installed on the ion coating machine 2 Target and two Cr metal targets, clean the coating chamber with a high-power vacuum cleaner; place the substrate after ultrasonic cleaning on the ...

Embodiment 2

[0044] 1. Preparation:

[0045] S1. Two TiBs are symmetrically installed on the ion coating machine 2 target and two metal targets, TiB 2 The target is a planar target, the atomic ratio of Ti and B is 1:2, and the purity is 99.99%; the metal target is a chromium (Cr) planar target, the purity is 99.99%, and the workpiece support is installed in the middle of the vacuum chamber.

[0046] S2. Clean the substrate: send the polished WC-Co cemented carbide substrate to the ultrasonic cleaning machine, and use acetone and absolute ethanol to conduct ultrasonic waves at 30kHz respectively. Clean for 30 minutes, then rinse with deionized water, and dry with nitrogen with a purity of ≥99.5%.

[0047] S3. Vacuuming and ion beam etching cleaning chamber: clean the coating chamber with a high-power vacuum cleaner; place the substrate after ultrasonic cleaning on the workpiece support in the vacuum chamber, and vacuum the vacuum chamber to a vacuum of 5.0×10 -3 Below Pa, then turn on th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of surface protection, and discloses a TiB2-based coating with a multicycle structure and a preparation method thereof. The TiB2-based coating is formed bysputtering deposition on a substrate by taking a TiB2 target and a metal target as raw materials and adopting magnetron sputtering coating; and the TiB2-based coating is of a multicycle structure inwhich a TiB2 layer and an elemental metal layer are overlapped with each other, the adjacent TiB2 layer and the elemental metal layer are in a large period, meanwhile, periodic structures exist in theTiB2 layer and the elemental metal layer respectively, the period in the TiB2 layer is formed by alternately overlapping a TiB2-rich layer and a TiB2-poor layer, and the period in the elemental metallayer is formed by alternately overlapping a metal-rich layer and a metal-poor layer. The coating not only reduces the residual stress, but also integrates the characteristics of high hardness, highstrength, high high-temperature oxidation resistance and good bonding force of the single-layer TiB2, and is used for protecting the surfaces of products such as mechanical parts and knife molds.

Description

technical field [0001] The invention belongs to the technical field of surface protection, and more specifically relates to a titanium diboride-based coating (TiB 2 ) and its preparation method and application. Background technique [0002] Titanium diboride (TiB 2 ), as a transition metal boride, is an advanced ceramic material with excellent structural and functional properties. Its crystal structure is mainly composed of strong covalent bonds and ionic bonds, and has high hardness, high melting point, high With a series of advantages such as wear resistance and corrosion resistance, good electrical and thermal conductivity, and excellent chemical stability, it is widely used in the fields of non-ferrous metal smelting, wear-resistant structural parts, cutting tools and protective materials. However TiB 2 The disadvantages of low self-diffusion coefficient, high residual stress, poor thermal stability and toughness of simple membrane affect its wide application in relat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/18C23C14/35
CPCC23C14/067C23C14/185C23C14/345C23C14/352
Inventor 代伟李谞王启民刘凡
Owner GUANGDONG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products