Titanium aluminum alloy surface high temperature oxidation and hot corrosion resistant Al-Cr coating and preparation method thereof
A high-temperature oxidation-resistant, titanium-aluminum alloy technology, used in chemical instruments and methods, metal material coating processes, coatings, etc. Parts, plasma liquid are expensive and other problems, to achieve the effect of improving high temperature oxidation resistance and thermal corrosion resistance, excellent oxidation resistance and thermal corrosion resistance, and excellent thermal shock resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0035] The preparation method of the above-mentioned high-temperature oxidation-resistant and heat-corrosion-resistant Al-Cr coating on the surface of the titanium-aluminum alloy includes first preparing a Cr diffusion layer on the surface of the titanium-aluminum alloy substrate, and then performing an aluminizing treatment on the surface of the Cr diffusion layer to prepare an Al-Cr alloy layer and rich Al deposition layer, the steps are as follows:
[0036] Step 1. Put the titanium-aluminum alloy substrate and the pure Cr target into the arc glow plasma surface metallurgy device, use the titanium-aluminum alloy substrate as the workpiece electrode, and use the pure Cr target as the source electrode; wherein, the pure Cr target The purity of Cr is 99.999wt%.
[0037] Step 2. Vacuumize to 5×10 -4 Pa~8×10 -4 Pa, send argon gas, start glow, and debug process parameters are: arc current: 50-70A; workpiece bias voltage: 250-350V; argon gas pressure: 0.3-0.5Pa; distance between ...
Embodiment 1
[0045] 1) O-Ti 2 AlNb-based alloys and pure Cr targets were loaded into an arc-added glow plasma surface metallurgy device, and O-Ti 2 The AlNb-based alloy is used as the workpiece electrode, and the pure Cr target is used as the source electrode. The purity of Cr in the target is 99.999%;
[0046] 2) Vacuum to 5×10 -4 Pa, send argon gas, start glow, and debug process parameters are: arc current: 50A; workpiece bias voltage: 250V; argon gas pressure: 0.3Pa; target and workpiece distance: 180mm; duty ratio: 0.2; holding time : 0.5h; Working temperature: 880~920℃;
[0047] 3) Stop the glow, cut off the power, and complete the preparation of the Cr diffusion layer;
[0048] 4) Put the sample prepared by the Cr diffusion layer and the pure Al target into the arc glow plasma surface metallurgy device, take the sample prepared by the Cr diffusion layer as the workpiece electrode, and use the pure Al target as the source electrode; , the purity of Al in the pure Al target materi...
Embodiment 2
[0054] 1) Put the γ-TiAl alloy and the pure Cr target into the arc glow plasma surface metallurgy device, use the γ-TiAl alloy as the workpiece electrode, and use the pure Cr target as the source. The purity of Cr in the target is 99.999%;
[0055] 2) Vacuum to 8×10 -4 P, send argon gas, start glow, and debug process parameters are: arc current: 50A; workpiece bias voltage: 350V; argon gas pressure: 0.5Pa; distance between target and workpiece: 150mm; duty cycle: 0.2; : 0.5h; Working temperature: 880~920℃;
[0056] 3) Stop the glow, cut off the power, and complete the preparation of the Cr diffusion layer;
[0057] 4) Put the sample prepared by the Cr diffusion layer and the pure Al target into the arc glow plasma surface metallurgy device, the sample prepared by the Cr diffusion layer is used as the workpiece electrode, and the pure Al target is used as the source electrode; , the purity of Al in the pure Al target material is 99.999wt%.
[0058] 5) Vacuum to 8×10 -4 P, ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com