Gallium oxide ultraviolet detector based on surface plasmon and preparation method and application thereof
A surface plasmon and ultraviolet detector technology, applied in electrical components, semiconductor devices, final product manufacturing, etc., can solve problems such as poor energy band coupling effect and insignificant gain effect, achieve stable performance and improve response sensitivity , the effect of surface electric field enhancement
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0052] This embodiment is used to illustrate the preparation process of the surface plasmon-based gallium oxide ultraviolet detector of the present invention. The specific preparation method is as follows:
[0053] Prepare the surface plasmon-enhanced Ga 2 o 3 Solar-blind ultraviolet detector, the difference is that step 2) divides three-layer deposition thin film, at first by the method in comparative example 1 step 2) deposition~125nm Ga 2 o 3 Then move the sample into a thermal evaporation system equipped with a high-purity metal Ga source. After the vacuum is pumped to 1E-4Pa, start to apply current to evaporate a 10nm metal Ga layer; finally, deposit a metal Ga layer and a gallium oxide layer. The sample of the layered film was placed in a magnetron sputtering chamber equipped with a gallium oxide target, and a ~125nm gallium oxide film was deposited according to the method of step 2) of Comparative Example 1 again.
Embodiment 2
[0055] The ultraviolet detector of the present invention was prepared in the same manner as in Example 1, except that the thickness of the thermally evaporated metal Ga layer in step 2) was 20 nm.
[0056] The sample obtained after the high-temperature annealing in Step 3) of Example 2 was scraped and ground with a blade to obtain a sample powder. And dipped a small amount of the above sample powder with the copper grid used by TEM, and carried out transmission electron microscope observation on the sample powder on the copper grid, and found the existence of metal gallium nanospheres, such as Figure 4 The two crystal face groups shown, the crystal plane distances are 0.2615nm and 0.2566nm respectively, and the angle between the crystal planes is about 76°, which indicates that these two crystal face groups correspond to the (110) and (021) planes of metal gallium respectively. . In addition, the results of TEM also show that the size of metal gallium nanospheres is about 10...
Embodiment 3
[0058] The ultraviolet detector of the present invention was prepared in the same manner as in Example 1, except that the thickness of the thermally evaporated metal Ga layer in step 2) was 30 nm.
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Size | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com