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Preparation method of high-aluminum borosilicate glass with excellent dielectric properties

A technology of dielectric properties and borosilicate glass, which is applied in the field of high-alumina borosilicate glass preparation, can solve problems such as rising melting temperature, high melting temperature environmental hazards, low dielectric constant, etc., to achieve accelerated melting, excellent dielectric Constant, the effect of satisfying the thermal expansion coefficient

Inactive Publication Date: 2019-03-22
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, its melting temperature also rises to 1800°C. Excessively high melting temperature not only increases the production cost, but also poses a huge challenge to traditional refractory materials and molding equipment.
[0010] At present, the glass with low dielectric constant contains alkali metal in its components, its melting temperature is too high, or it contains many components that are harmful to the environment, so that it cannot be used for electronic substrate glass

Method used

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  • Preparation method of high-aluminum borosilicate glass with excellent dielectric properties
  • Preparation method of high-aluminum borosilicate glass with excellent dielectric properties

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Step 1), according to raw material mole fraction, accurately weigh 67.64% quartz sand, 9.83% boric anhydride, 11.06% alumina powder, 2.24% magnesium oxide, 8.62% calcium oxide, 0.54% strontium oxide and 0.07% % tin oxide;

[0027] Step 2), put the weighed raw materials into the mixer in turn, and mix until the uniformity is greater than 99% to form a batch;

[0028] Step 3), preheat the alumina crucible to 1450°C with the furnace, and add batch materials; then, heat up to 1680°C for 50-60 minutes, and keep the temperature for 240 minutes;

[0029] Step 4), put the glass into an annealing furnace, and anneal at 740-760°C;

[0030] In step 5), the temperature is lowered to room temperature at a cooling rate of 1-3° C. / min to obtain a high-alumina borosilicate glass with excellent dielectric properties.

[0031] see figure 1 with him figure 2 As shown, the density of high-alumina borosilicate glass with excellent dielectric properties measured by ASTM C-693 standard i...

Embodiment 2

[0033] Step 1), according to raw material mole fraction, accurately weigh 67.57% quartz sand, 9.83% boric anhydride, 11.05% alumina powder, 2.24% magnesium oxide, 8.62% calcium oxide, 0.54% strontium oxide, 0.08 % barium oxide and 0.07% tin oxide;

[0034] Step 2), put the weighed raw materials into the mixer in turn, and mix until the uniformity is greater than 99% to form a batch;

[0035]Step 3), preheat the alumina crucible to 1450°C with the furnace, and add batch materials; then, heat up to 1680°C for 50-60 minutes, and keep the temperature for 240 minutes;

[0036] Step 4), put the glass into an annealing furnace, and anneal at 740-760°C;

[0037] In step 5), the temperature is lowered to room temperature at a cooling rate of 1-3° C. / min to obtain a high-alumina borosilicate glass with excellent dielectric properties.

[0038] see figure 1 with him figure 2 As shown, the density of high-alumina borosilicate glass with excellent dielectric properties measured by AST...

Embodiment 3

[0040] Step 1), according to raw material mole fraction, accurately weigh 67.50% quartz sand, 9.82% boric anhydride, 11.04% alumina powder, 2.24% magnesium oxide, 8.62% calcium oxide, 0.54% strontium oxide, 0.17% % barium oxide and 0.07% tin oxide;

[0041] Step 2), put the weighed raw materials into the mixer in turn, and mix until the uniformity is greater than 99% to form a batch;

[0042] Step 3), preheat the alumina crucible to 1450°C with the furnace, and add batch materials; then, heat up to 1680°C for 50-60 minutes, and keep the temperature for 240 minutes;

[0043] Step 4), put the glass into an annealing furnace, and anneal at 740-760°C;

[0044] In step 5), the temperature is lowered to room temperature at a cooling rate of 1-3° C. / min to obtain a high-alumina borosilicate glass with excellent dielectric properties.

[0045] see figure 1 with him figure 2 As shown, the density of high-alumina borosilicate glass with excellent dielectric properties measured by A...

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Abstract

The invention discloses a preparation method of high-aluminum borosilicate glass with excellent dielectric properties. According to the method, BaO is added, the addition amount of the BaO is optimized, and the high-aluminum borosilicate glass is prepared with a high-temperature melting method; since the BaO is contained in raw materials, the melting accelerating effect is achieved; cations Ba<2+>thereof are filled in a network space, so that movement of alkaline earth metal ions is hindered; the dielectric constant is reduced, the electrical resistance is increased, the electrical performance requirements of electronic substrate glass are met, and the heat expansion coefficient, the density and other properties are also met, so that the high-aluminum borosilicate glass has an excellentdielectric constant, the electrical performance thereof meets the requirements, and the requirements of the electronic substrate glass are met.

Description

technical field [0001] The invention relates to electronic substrate glass, in particular to a method for preparing high-alumina borosilicate glass with excellent dielectric properties. Background technique [0002] Since the 21st century, with the rapid popularization of electronic products such as mobile phones, tablet computers, and PDAs, the demand for high-performance display materials is also increasing. TFT-LCD is currently the best color display device. It is the mainstream display device on small terminal display devices such as mobile phones, MP3 players, MP4 players, and car navigation systems, as well as TVs, notebook computers, and desktops. TFT-LCD has become a flat panel Displays the mainstream offerings for the product. The panel material of liquid crystal display (LCD) is mainly composed of substrate glass, liquid crystal, color filter (Color Filter), thin film transistor, driving circuit (IC), backlight source, polarizer, etc., and a TFT-LCD panel needs to...

Claims

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Application Information

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IPC IPC(8): C03C6/02
CPCC03C1/00
Inventor 郭宏伟童强刘磊党梦阳王翠翠陈平谢驰刘帅
Owner SHAANXI UNIV OF SCI & TECH
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