High-hardness material of high-entropy alloy nitride coating and preparation method of the high-hard material
A technology of high-entropy alloys and nitrides, applied in the field of materials science, can solve problems such as coating hardness and poor wear performance, and achieve the effects of low cost, simple production process, and low equipment requirements
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[0034] The instruments used in the preparation method of the present invention are: KQ2200DE type ultrasonic cleaning machine; WK-II type non-consumable vacuum arc melting furnace; wire cutting machine; MSP-400B type magnetron sputtering apparatus. The coating was prepared by MSP-400B magnetron sputtering apparatus and reactive sputtering method.
[0035] The test method adopted in the present invention: field emission electron microscope (SEM) to observe microscopic appearance; Energy Spectrometer (EDS) to analyze components; Nano-indentation instrument to measure nano-hardness and elastic modulus; Wear instrument to measure friction coefficient.
[0036] The invention discloses a high-hardness material of a high-entropy alloy nitride coating, which consists of a Cr transition layer on the surface of a substrate, a CrN transition layer on the surface of the Cr transition layer, and a nitride coating on the surface of the CrN transition layer. Layer composition; the nitride co...
Embodiment 1
[0045] Step 1: Target Preparation
[0046] Select aluminum, silicon, titanium, chromium, niobium and vanadium with a purity higher than 99.9%, that is, Al, Si, Ti, Cr, Nb, V bulk and granular metals, prepare raw materials in an atomic equimolar ratio, and carry out Ultrasonic cleaning of alcohol, acetone and alcohol, and finally put the raw materials into WK-Ⅱ non-consumable vacuum arc melting furnace to prepare high-entropy alloy ingots; put the melted high-entropy alloy ingots into wire electric discharge machine Cut to make a high-entropy alloy substrate with a diameter of 60 mm and a thickness of 5 mm, polish it, and repeat the above-mentioned ultrasonic cleaning process to finally obtain a high-entropy alloy target.
[0047] Step 2: Clean the high-entropy alloy target and the substrate to be processed
[0048] The mirror-polished high-entropy alloy target and the substrate to be treated were cleaned sequentially in absolute ethanol and acetone by ultrasonic cleaning for ...
Embodiment 2
[0058] Step 1: Target Preparation
[0059] Select aluminum, silicon, titanium, chromium, niobium and vanadium with a purity higher than 99.9%, that is, Al, Si, Ti, Cr, Nb, V bulk and granular metals, prepare raw materials in an atomic equimolar ratio, and carry out Ultrasonic cleaning of alcohol, acetone and alcohol, and finally put the raw materials into WK-Ⅱ non-consumable vacuum arc melting furnace to prepare high-entropy alloy ingots; put the melted high-entropy alloy ingots into wire electric discharge machine Cut to make a high-entropy alloy substrate with a diameter of 60 mm and a thickness of 5 mm, polish it, and repeat the above-mentioned ultrasonic cleaning process to finally obtain a high-entropy alloy target.
[0060] Step 2: Clean the high-entropy alloy target and the substrate to be processed
[0061] The mirror-polished high-entropy alloy target and the substrate to be treated were cleaned sequentially in absolute ethanol and acetone by ultrasonic cleaning for ...
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Abstract
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